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Computational lithography /
A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since t...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Hoboken, N.J. :
Wiley,
©2010.
|
| Colección: | Wiley series in pure and applied optics.
|
| Temas: | |
| Acceso en línea: | Texto completo (Requiere registro previo con correo institucional) |
MARC
| LEADER | 00000cam a2200000 a 4500 | ||
|---|---|---|---|
| 001 | OR_ocn689995793 | ||
| 003 | OCoLC | ||
| 005 | 20231017213018.0 | ||
| 006 | m o d | ||
| 007 | cr cn||||||||| | ||
| 008 | 101206s2010 njua ob 001 0 eng d | ||
| 010 | |a 2009049250 | ||
| 040 | |a DG1 |b eng |e pn |c DG1 |d N$T |d YDXCP |d EBLCP |d DG1 |d OCLCQ |d CDX |d E7B |d OCLCQ |d MERUC |d OCLCO |d OCLCQ |d UMI |d B24X7 |d DEBSZ |d OCLCA |d OCLCQ |d IDEBK |d UKDOC |d AU@ |d DEBBG |d COO |d OCLCQ |d COCUF |d DG1 |d LIP |d ZCU |d OCLCQ |d U3W |d OCLCQ |d OCLCF |d CEF |d ICG |d INT |d VT2 |d OCLCQ |d WYU |d OCLCQ |d UAB |d OCLCQ |d DKC |d OCLCQ |d S9I |d OCLCQ |d EYM |d OCLCQ |d OCLCO |d UKCRE |d S2H |d UKAHL |d OCLCO |d OCLCQ | ||
| 019 | |a 664571240 |a 666256266 |a 729019735 |a 781348225 |a 840106094 |a 1055354515 |a 1064110733 |a 1081255421 |a 1103251908 |a 1129352213 |a 1152991698 | ||
| 020 | |a 9780470618943 |q (electronic bk.) | ||
| 020 | |a 0470618949 |q (electronic bk.) | ||
| 020 | |a 9780470618936 |q (electronic bk.) | ||
| 020 | |a 0470618930 |q (electronic bk.) | ||
| 020 | |a 9780470596975 |q (cloth) | ||
| 020 | |a 047059697X |q (cloth) | ||
| 020 | |a 9781118043578 | ||
| 020 | |a 111804357X | ||
| 024 | 7 | |a 10.1002/9780470618943 |2 doi | |
| 024 | 8 | |a 9786612755965 | |
| 029 | 1 | |a AU@ |b 000048820014 | |
| 029 | 1 | |a AU@ |b 000051433247 | |
| 029 | 1 | |a AU@ |b 000053276933 | |
| 029 | 1 | |a AU@ |b 000060068049 | |
| 029 | 1 | |a CHBIS |b 010880090 | |
| 029 | 1 | |a CHNEW |b 000937039 | |
| 029 | 1 | |a CHVBK |b 48017346X | |
| 029 | 1 | |a DEBBG |b BV041121553 | |
| 029 | 1 | |a DEBBG |b BV041910183 | |
| 029 | 1 | |a DEBBG |b BV043392582 | |
| 029 | 1 | |a DEBBG |b BV044147090 | |
| 029 | 1 | |a DEBSZ |b 396764703 | |
| 029 | 1 | |a DEBSZ |b 430892632 | |
| 029 | 1 | |a DEBSZ |b 449207684 | |
| 029 | 1 | |a DEBSZ |b 484997025 | |
| 029 | 1 | |a GBVCP |b 790197553 | |
| 029 | 1 | |a NZ1 |b 14255591 | |
| 035 | |a (OCoLC)689995793 |z (OCoLC)664571240 |z (OCoLC)666256266 |z (OCoLC)729019735 |z (OCoLC)781348225 |z (OCoLC)840106094 |z (OCoLC)1055354515 |z (OCoLC)1064110733 |z (OCoLC)1081255421 |z (OCoLC)1103251908 |z (OCoLC)1129352213 |z (OCoLC)1152991698 | ||
| 037 | |a 10.1002/9780470618943 |b Wiley InterScience |n http://www3.interscience.wiley.com | ||
| 050 | 4 | |a TK7872.M3 |b C66 2010 | |
| 072 | 7 | |a TEC |x 008010 |2 bisacsh | |
| 082 | 0 | 4 | |a 621.3815/31 |2 22 |
| 049 | |a UAMI | ||
| 100 | 1 | |a Ma, Xu, |d 1983- | |
| 245 | 1 | 0 | |a Computational lithography / |c Xu Ma and Gonzalo R. Arce. |
| 260 | |a Hoboken, N.J. : |b Wiley, |c ©2010. | ||
| 300 | |a 1 online resource (xv, 226 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Wiley series in pure and applied optics | |
| 505 | 0 | |a Optical Lithography Systems -- Rule-Based Resolution Enhancement Techniques -- Fundamentals of Optimization -- Computational Lithography with Coherent Illumination -- Regularization Framework -- Computational Lithography with Partially Coherent Illumination -- Other RET Optimization Techniques -- Source and Mask Optimization -- Coherent Thick-Mask Optimization -- Conclusions and New Directions of Computational Lithography -- Appendix A: Formula Derivation in Chapter 5 -- Appendix B: Manhattan Geometry -- Appendix C: Formula Derivation in Chapter 6 -- Appendix D: Formula Derivation in Chapter 7 -- Appendix E: Formula Derivation in Chapter 8 -- Appendix F: Formula Derivation in Chapter 9 -- Appendix G: Formula Derivation in Chapter 10 -- Appendix H: Software Guide. | |
| 504 | |a Includes bibliographical references and index. | ||
| 588 | 0 | |a Print version record. | |
| 520 | |a A Unified Summary of the Models and Optimization Methods Used in Computational Lithography. Optical lithography is one of the most challenging areas of current integrated circuit manufacturing technology. The semiconductor industry is relying more on resolution enhancement techniques (RETs), since their implementation does not require significant changes in fabrication infrastructure. Computational Lithography is the first book to address the computational optimization of RETs in optical lithography, providing an in-depth discussion of optimal optical proximity correction (OPC), phase shifting. | ||
| 590 | |a O'Reilly |b O'Reilly Online Learning: Academic/Public Library Edition | ||
| 650 | 0 | |a Microlithography |x Mathematics. | |
| 650 | 0 | |a Integrated circuits |x Design and construction |x Mathematics. | |
| 650 | 0 | |a Photolithography |x Mathematics. | |
| 650 | 0 | |a Semiconductors |x Etching |x Mathematics. | |
| 650 | 0 | |a Resolution (Optics) | |
| 650 | 6 | |a Microlithographie |x Mathématiques. | |
| 650 | 6 | |a Circuits intégrés |x Conception et construction |x Mathématiques. | |
| 650 | 6 | |a Photolithographie |x Mathématiques. | |
| 650 | 6 | |a Semi-conducteurs |x Attaque chimique |x Mathématiques. | |
| 650 | 6 | |a Résolution (Optique) | |
| 650 | 7 | |a resolution (optical concept) |2 aat | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Circuits |x General. |2 bisacsh | |
| 650 | 7 | |a Resolution (Optics) |2 fast |0 (OCoLC)fst01095604 | |
| 700 | 1 | |a Arce, Gonzalo R. | |
| 776 | 0 | 8 | |i Print version: |a Ma, Xu, 1983- |t Computational lithography. |d Hoboken, N.J. : Wiley, ©2010 |z 9780470596975 |w (DLC) 2009049250 |w (OCoLC)460050552 |
| 830 | 0 | |a Wiley series in pure and applied optics. | |
| 856 | 4 | 0 | |u https://learning.oreilly.com/library/view/~/9781118043578/?ar |z Texto completo (Requiere registro previo con correo institucional) |
| 938 | |a Askews and Holts Library Services |b ASKH |n AH16073901 | ||
| 938 | |a 123Library |b 123L |n 22695 | ||
| 938 | |a Books 24x7 |b B247 |n bke00036422 | ||
| 938 | |a Coutts Information Services |b COUT |n 15047072 | ||
| 938 | |a EBL - Ebook Library |b EBLB |n EBL588875 | ||
| 938 | |a ebrary |b EBRY |n ebr10419114 | ||
| 938 | |a EBSCOhost |b EBSC |n 335298 | ||
| 938 | |a ProQuest MyiLibrary Digital eBook Collection |b IDEB |n 275596 | ||
| 938 | |a YBP Library Services |b YANK |n 3324176 | ||
| 938 | |a YBP Library Services |b YANK |n 3134170 | ||
| 938 | |a YBP Library Services |b YANK |n 12669303 | ||
| 994 | |a 92 |b IZTAP | ||