Nanoscale CMOS VLSI circuits : design for manufacturability /

Covering the latest devices; technologies; and processes; this detailed guide offers proven methods for optimizing circuit designs to increase the yield; reliability; and manufacturability of products and mitigate defects and failure.

Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Kundu, Sandip (Autor)
Otros Autores: Sreedhar, Aswin, Penn, Michael, Fogarty, David E., Darnell, Matt
Formato: Electrónico eBook
Idioma:Inglés
Publicado: New York, N.Y. : McGraw-Hill Education, [2011]
Edición:First edition.
Colección:McGraw-Hill's AccessEngineering.
Temas:
Metal oxide semiconductors, Complementary > Design and construction.
Integrated circuits > Very large scale integration > Design and construction.
Electronic books.
Acceso en línea:Texto completo

MARC

LEADER 00000nam a2200000 i 4500
001 MGH_AEccn00337441
003 IN-ChSCO
005 20210416124538.0
006 m|||||||||||||||||
007 cr |n||||||||n
008 210416s2011||||nyu|||||o|||||||||||eng||
010 |z  2010022678 
020 |a 007177632X 
020 |a 9780071635196 
020 |a 007163519X (print-ISBN) 
035 |a (OCoLC)670295267 
040 |a IN-ChSCO  |b eng  |e rda 
041 0 |a eng 
050 4 |a TK7871.99.M44 
082 0 4 |a 621.39/5  |2 22 
100 1 |a Kundu, Sandip.,  |e author. 
245 1 0 |a Nanoscale CMOS VLSI circuits :  |b design for manufacturability /  |c Sandip Kundu, Aswin Sreedhar. 
246 3 |a Nanoscale complementary metal oxide semiconductor very large-scale integration circuits 
250 |a First edition. 
264 1 |a New York, N.Y. :  |b McGraw-Hill Education,  |c [2011] 
264 4 |c ?2011 
300 |a 1 online resource (xv, 296 pages) :  |b illustrations. 
336 |a text  |2 rdacontent 
337 |a computer  |2 rdamedia 
338 |a online resource  |2 rdacarrier 
490 1 |a McGraw-Hill's AccessEngineering 
500 |a Print version c2010. 
504 |a Includes bibliographical references and index. 
505 0 |a Semiconductor manufacturing -- Process and device variability : analysis and modeling -- Manufacturing-aware physical design closure -- Metrology, manufacturing defects, and defect extraction -- Defect impact modeling and yield improvement techniques -- Physical design and reliability -- Design for manufacturability : tools and methodologies. 
520 0 |a Covering the latest devices; technologies; and processes; this detailed guide offers proven methods for optimizing circuit designs to increase the yield; reliability; and manufacturability of products and mitigate defects and failure. 
530 |a Also available in print edition. 
533 |a Electronic reproduction.  |b New York, N.Y. :  |c McGraw Hill,   |d 2011.  |n Mode of access: World Wide Web.  |n System requirements: Web browser.  |n Access may be restricted to users at subscribing institutions. 
538 |a Mode of access: Internet via World Wide Web. 
546 |a In English. 
588 |a Description based on cover image and table of contents, viewed on July 27, 2011. 
650 0 |a Metal oxide semiconductors, Complementary  |x Design and construction. 
650 0 |a Integrated circuits  |x Very large scale integration  |x Design and construction. 
655 0 |a Electronic books. 
700 1 |a Sreedhar, Aswin. 
700 1 |a Penn, Michael. 
700 1 |a Fogarty, David E. 
700 1 |a Darnell, Matt. 
700 1 |a Kundu, Sandip. 
740 0 2 |a Semiconductor manufacturing. 
740 0 2 |a Process and device variability: analysis and modeling. 
740 0 2 |a Manufacturing-aware physical design closure. 
740 0 2 |a Metrology, manufacturing defects, and defect extraction. 
740 0 2 |a Defect impact modeling and yield improvement techniques. 
740 0 2 |a Physical design and reliability. 
740 0 2 |a Design for manufacturability: tools and methodologies. 
776 0 |i Print version:   |t Nanoscale CMOS VLSI circuits : design for manufacturability.  |b First edition.  |d New York, N.Y. : McGraw-Hill Education, 2011  |w (OCoLC)426811674 
830 0 |a McGraw-Hill's AccessEngineering. 
856 4 0 |u https://accessengineeringlibrary.uam.elogim.com/content/book/9780071635196  |z Texto completo 
997 |a (c)2011 Cassidy Cataloguing Services, Inc. 

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