Extreme ultraviolet lithography /

"Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL expe...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Wu, Banqiu, Kumar, Ajay, 1962-, Eynon, Benjamin G., Naulleau, Patrick, Richardson, Martin, La Fontaine, Bruno, Yulin, Sergiy, Silver, Richard M., Vladar, Andras E., Kamberian, Henry
Formato: Electrónico eBook
Idioma:Inglés
Publicado: New York, N.Y. : McGraw-Hill Education, [2009]
Edición:First edition.
Colección:McGraw-Hill's AccessEngineering.
Temas:
Extreme ultraviolet lithography.
Integrated circuits > Masks.
Integrated circuits > Design and construction.
Electronic books.
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Exposure system
  • EUV sources
  • EUV optics
  • Multilayer interference coatings for EUVL
  • EUV photoresist
  • EUVL masks.

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