Extreme ultraviolet lithography /

"Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL expe...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Wu, Banqiu, Kumar, Ajay, 1962-, Eynon, Benjamin G., Naulleau, Patrick, Richardson, Martin, La Fontaine, Bruno, Yulin, Sergiy, Silver, Richard M., Vladar, Andras E., Kamberian, Henry
Formato: Electrónico eBook
Idioma:Inglés
Publicado: New York, N.Y. : McGraw-Hill Education, [2009]
Edición:First edition.
Colección:McGraw-Hill's AccessEngineering.
Temas:
Extreme ultraviolet lithography.
Integrated circuits > Masks.
Integrated circuits > Design and construction.
Electronic books.
Acceso en línea:Texto completo

MARC

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020 |a 0071664793 
020 |a 9780071549189 
020 |a 0071549188 (print-ISBN) 
035 |a (OCoLC)605931860 
040 |a IN-ChSCO  |b eng  |e rda 
041 0 |a eng 
050 4 |a TK7872.M3 
082 0 4 |a 621.3815/31  |2 22 
245 0 0 |a Extreme ultraviolet lithography /  |c edited by Banqiu Wu, Ajay Kumar. 
250 |a First edition. 
264 1 |a New York, N.Y. :  |b McGraw-Hill Education,  |c [2009] 
264 4 |c ?2009 
300 |a 1 online resource (xiv, 465 pages) :  |b illustrations. 
336 |a text  |2 rdacontent 
337 |a computer  |2 rdamedia 
338 |a online resource  |2 rdacarrier 
490 1 |a McGraw-Hill's AccessEngineering 
500 |a Print version c2009. 
504 |a Includes bibliographical references and index. 
505 0 |a Exposure system -- EUV sources -- EUV optics -- Multilayer interference coatings for EUVL -- EUV photoresist -- EUVL masks. 
520 0 |a "Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL experts, the reference contains contributions by prominent engineers at leading semi-conductor manufacturers such as Intel and ASM Lithography.Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EU Voptics, defect control, resist, mask techniques, and more.". 
530 |a Also available in print edition. 
533 |a Electronic reproduction.  |b New York, N.Y. :  |c McGraw Hill,   |d 2009.  |n Mode of access: World Wide Web.  |n System requirements: Web browser.  |n Access may be restricted to users at subscribing institutions. 
538 |a Mode of access: Internet via World Wide Web. 
546 |a In English. 
588 |a Description based on cover image and table of contents, viewed on August 20, 2009. 
650 0 |a Extreme ultraviolet lithography. 
650 0 |a Integrated circuits  |x Masks. 
650 0 |a Integrated circuits  |x Design and construction. 
655 0 |a Electronic books. 
700 1 |a Wu, Banqiu. 
700 1 |a Kumar, Ajay,  |d 1962- 
700 1 |a Eynon, Benjamin G. 
700 1 |a Naulleau, Patrick. 
700 1 |a Richardson, Martin. 
700 1 |a La Fontaine, Bruno. 
700 1 |a Yulin, Sergiy. 
700 1 |a Silver, Richard M. 
700 1 |a Vladar, Andras E. 
700 1 |a Kamberian, Henry. 
740 0 2 |a Exposure system. 
740 0 2 |a EUV sources. 
740 0 2 |a EUV optics. 
740 0 2 |a Multilayer interference coatings for EUVL. 
740 0 2 |a EUV metrology. 
740 0 2 |a EUV photoresist. 
740 0 2 |a EUVL masks. 
776 0 |i Print version:   |t Extreme ultraviolet lithography.  |b First edition.  |d New York, N.Y. : McGraw-Hill Education, 2009  |w (OCoLC)244060505 
830 0 |a McGraw-Hill's AccessEngineering. 
856 4 0 |u https://accessengineeringlibrary.uam.elogim.com/content/book/9780071549189  |z Texto completo 
997 |a (c)2009 Cassidy Cataloguing Services, Inc. 

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