Extreme ultraviolet lithography /

"Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL expe...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Wu, Banqiu, Kumar, Ajay, 1962-, Eynon, Benjamin G., Naulleau, Patrick, Richardson, Martin, La Fontaine, Bruno, Yulin, Sergiy, Silver, Richard M., Vladar, Andras E., Kamberian, Henry
Formato: Electrónico eBook
Idioma:Inglés
Publicado: New York, N.Y. : McGraw-Hill Education, [2009]
Edición:First edition.
Colección:McGraw-Hill's AccessEngineering.
Temas:
Extreme ultraviolet lithography.
Integrated circuits > Masks.
Integrated circuits > Design and construction.
Electronic books.
Acceso en línea:Texto completo
Descripción
Sumario:"Explains the most promising innovation in microlithography today. This landmark resource provides the first complete guide to extreme ultraviolet lithography (EUVL), covering the latest scientific theory, processing methods, applications, and future directions. Edited by two renowned EUVL experts, the reference contains contributions by prominent engineers at leading semi-conductor manufacturers such as Intel and ASM Lithography.Designed to help you optimize EUVL, Extreme Ultraviolet Lithography covers EUV lithography tools, EUV printer, EUV sources, multilayer EUV, EU Voptics, defect control, resist, mask techniques, and more.".
Notas:Print version c2009.
Descripción Física:1 online resource (xiv, 465 pages) : illustrations.
Also available in print edition.
Bibliografía:Includes bibliographical references and index.
ISBN:0071664793
9780071549189
0071549188 (print-ISBN)

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