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Principles of lithography /
"This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, to...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Bellingham, Washington, USA :
SPIE Press,
[2019]
|
| Edición: | Fourth edition. |
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
| LEADER | 00000cam a22000008i 4500 | ||
|---|---|---|---|
| 001 | KNOVEL_on1083675292 | ||
| 003 | OCoLC | ||
| 005 | 20231027140348.0 | ||
| 006 | m o d | ||
| 007 | cr |n||||||||| | ||
| 008 | 190122s2019 ohu ob 001 0 eng | ||
| 010 | |a 2019003004 | ||
| 040 | |a DLC |b eng |e rda |c DLC |d OCLCO |d OCLCF |d SPIES |d UIU |d OCLCQ |d UPM |d YDX |d OCLCO |d OCLCQ | ||
| 020 | |a 9781510627611 |q (pdf) | ||
| 020 | |a 1510627618 |q (pdf) | ||
| 020 | |a 9781510627628 |q (epub) | ||
| 020 | |a 1510627626 |q (epub) | ||
| 020 | |a 9781510627635 |q (mobi) | ||
| 020 | |a 1510627634 |q (mobi) | ||
| 020 | |z 9781510627604 | ||
| 020 | |z 151062760X | ||
| 029 | 1 | |a AU@ |b 000065707306 | |
| 029 | 1 | |a AU@ |b 000065479981 | |
| 035 | |a (OCoLC)1083675292 | ||
| 042 | |a pcc | ||
| 050 | 1 | 0 | |a TK7874 |
| 082 | 0 | 0 | |a 621.3815/31 |2 23 |
| 049 | |a UAMI | ||
| 100 | 1 | |a Levinson, Harry J., |e author. | |
| 245 | 1 | 0 | |a Principles of lithography / |c Harry J. Levinson. |
| 250 | |a Fourth edition. | ||
| 264 | 1 | |a Bellingham, Washington, USA : |b SPIE Press, |c [2019] | |
| 264 | 4 | |c ©2019 | |
| 300 | |a 1 online resource | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | |a Overview of lithography -- Optical pattern formation -- Photoresists -- Modeling and thin-film effects -- Wafer steppers and scanners -- Overlay -- Masks and reticles -- Confronting the diffraction limit -- Metrology -- Immersion lithography and the limits of optical lithography -- Lithography costs -- Extreme ultraviolet lithography -- Alternative lithography techniques. | |
| 520 | |a "This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus"-- |c Provided by publisher. | ||
| 588 | 0 | |a Print version record and CIP data provided by publisher; resource not viewed. | |
| 590 | |a Knovel |b ACADEMIC - Optics & Photonics | ||
| 590 | |a Knovel |b ACADEMIC - Chemistry & Chemical Engineering | ||
| 650 | 0 | |a Integrated circuits |x Design and construction. | |
| 650 | 0 | |a Microlithography. | |
| 650 | 6 | |a Circuits intégrés |x Conception et construction. | |
| 650 | 6 | |a Microlithographie. | |
| 650 | 7 | |a Integrated circuits |x Design and construction. |2 fast |0 (OCoLC)fst00975545 | |
| 650 | 7 | |a Microlithography. |2 fast |0 (OCoLC)fst01019883 | |
| 776 | 0 | 8 | |i Print version: |a Levinson, Harry J. |t Principles of lithography. |b Fourth edition. |d Bellingham, Washington, USA : SPIE Press, [2019] |z 9781510627604 |w (DLC) 2019000488 |
| 856 | 4 | 0 | |u https://appknovel.uam.elogim.com/kn/resources/kpPLE00013/toc |z Texto completo |
| 938 | |a YBP Library Services |b YANK |n 17220277 | ||
| 938 | |a Society of Photo-Optical Instrumentation Engineers |b SPIE |n 9781510627611 | ||
| 994 | |a 92 |b IZTAP | ||