Cargando…
Optical physics for nanolithography /
This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essentia...
| Clasificación: | Libro Electrónico |
|---|---|
| Autores principales: | , |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Bellingham, Washington (1000 20th St. Bellingham WA 98225-6705 USA) :
SPIE,
2018.
|
| Colección: | SPIE Press monograph ;
PM284. |
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
| LEADER | 00000cam a2200000Mi 4500 | ||
|---|---|---|---|
| 001 | KNOVEL_on1028853536 | ||
| 003 | OCoLC | ||
| 005 | 20231027140348.0 | ||
| 006 | m eo d | ||
| 007 | cr bn||||m|||a | ||
| 008 | 180314s2018 waua ob 001 0 eng d | ||
| 040 | |a SPIES |b eng |e rda |e pn |c SPIES |d OCLCO |d OCLCQ |d OCLCF |d UIU |d YDX |d COO |d EZ9 |d CAUOI |d OCLCA |d OCLCQ |d WYU |d U3W |d LVT |d YOU |d UPM |d AU@ |d OCLCQ |d N$T |d KIJ |d OCLCO |d OCLCQ | ||
| 019 | |a 1036293546 |a 1162136610 |a 1231613579 |a 1244635342 | ||
| 020 | |a 1510617388 |q (pdf) | ||
| 020 | |a 9781510617384 |q (electronic bk.) | ||
| 020 | |z 9781510617377 |q (softcover) | ||
| 020 | |z 151061737X | ||
| 024 | 7 | |a 10.1117/3.2314953 |2 doi | |
| 035 | |a (OCoLC)1028853536 |z (OCoLC)1036293546 |z (OCoLC)1162136610 |z (OCoLC)1231613579 |z (OCoLC)1244635342 | ||
| 050 | 4 | |a QC355.3 |b .Y456 2018eb | |
| 082 | 0 | 4 | |a 535 |2 23 |
| 049 | |a UAMI | ||
| 100 | 1 | |a Yen, Anthony, |e author. | |
| 245 | 1 | 0 | |a Optical physics for nanolithography / |c Anthony Yen, Shinn-Sheng Yu. |
| 264 | 1 | |a Bellingham, Washington (1000 20th St. Bellingham WA 98225-6705 USA) : |b SPIE, |c 2018. | |
| 300 | |a 1 online resource (352 pages) : |b color illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a SPIE Press monograph ; |v PM284 | |
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | |a Preface -- Notations and conventions -- 1. Mathematical preliminaries: 1.1. Mean-value theorems of integral calculus; 1.2. The delta function; 1.3. Weierstrass' approximation theorem; 1.4. Fourier transform; 1.5. Vector algebra; 1.6. Vector calculus; 1.7. Curvilinear coordinates; 1.8. Solution to Poisson's equation; 1.9. Helmholtz's theorem -- 2. Electromagnetic waves in free space: 2.1. Maxwell's equations in free space; 2.2. Electromagnetic radiation; 2.3. Systematic solution of inhomogeneous wave equations with boundary and initial conditions; 2.4. Solution inhomogeneous wave equations with harmonic time dependence -- 3. Electromagnetic waves in material media: 3.1. Macroscopic fields in material media; 3.2. Energy in electromagnetic fields; 3.3. Hertz vectors; 3.4. Fields of an electric dipole; 3.5. Dielectric properties of matter; 3.6. Physical origin of reflection and transmission; Ewald-Oseen extinction theorem; 3.7. Reflection and transmission upon incidence on a multilayer stack -- 4. Elements of geometrical optics: 4.1. Geometrical wavefronts and light rays; 4.2. Fermat's principle; 4.3. The characteristic functions of Hamilton; 4.4. The sine condition; 4.5. The Herschel condition; 4.6. The paraxial approximation; 4.7. The Smith-Helmholtz invariant; 4.8. The thin lens formula; 4.9. Stops, pupils, and windows; 4.10. Chief and marginal rays; meridional, tangential, and sagittal planes; meridional and skew rays. | |
| 505 | 8 | |a 5. Diffraction of electromagnetic waves: 5.1. The scalar theory of diffraction; 5.2. Fresnel and Fraunhofer approximations; 5.3. Representation of the diffracted field by the angular spectrum of plane waves; 5.4. The vector theory of diffraction -- 6. Image formation in an optical system: 6.1. Heuristic imaging theory; 6.2. The lithographic imaging system; 6.3. Imaging by a point source: coherent imaging; 6.4. Imaging by an extended source: partially coherent imaging; 6.5. Yamazoe's stacked shifted pupil formulation; 6.6. Imaging with a higher numerical aperture: radiometric correction; 6.7. 3-D point spread function; 6.8. Imaging with a higher numerical aperture: polarization effect -- 7. Aberrations in optical imaging systems: 7.1. Design of aspherical surfaces; 7.2. Connection between ray and wave aberrations; 7.3. The wave aberration for rotationally symmetric optical systems: Seidel aberrations; 7.4. General form of the aberration function for rotationally symmetric optical systems; 7.5. Digression: Gram-Schmidt orthogonalization process and orthogonal polynomials; 7.6. Orthogonal polynomials for expanding the aberration function: Zernike polynomials -- Index. | |
| 520 | |a This book provides an in-depth, self-contained introduction of partially coherent imaging theory for researchers and engineers working on optical lithography for semiconductor manufacturing, including those in the EDA industry. It is mathematically complete: the opening chapters discuss the essential principles, and all derivations are presented with their intermediate steps. For increased accessibility, simplified and consistent notations are used throughout the text. Full-color pages illustrate the connections between figures and equations. | ||
| 590 | |a Knovel |b ACADEMIC - Optics & Photonics | ||
| 590 | |a Knovel |b ACADEMIC - Chemistry & Chemical Engineering | ||
| 650 | 0 | |a Optics. | |
| 650 | 0 | |a Imaging systems. | |
| 650 | 0 | |a Nanolithography. | |
| 650 | 6 | |a Optique. | |
| 650 | 6 | |a Imagerie (Technique) | |
| 650 | 6 | |a Nanolithographie. | |
| 650 | 7 | |a optics. |2 aat | |
| 650 | 7 | |a Imaging systems. |2 fast |0 (OCoLC)fst00967605 | |
| 650 | 7 | |a Nanolithography. |2 fast |0 (OCoLC)fst01894717 | |
| 650 | 7 | |a Optics. |2 fast |0 (OCoLC)fst01046845 | |
| 700 | 1 | |a Yu, Shinn-Sheng, |e author. | |
| 710 | 2 | |a Society of Photo-optical Instrumentation Engineers, |e publisher. | |
| 776 | 0 | 8 | |i Print version: |z 151061737X |z 9781510617377 |w (DLC) 2018930737 |
| 830 | 0 | |a SPIE Press monograph ; |v PM284. | |
| 856 | 4 | 0 | |u https://appknovel.uam.elogim.com/kn/resources/kpOPN00002/toc |z Texto completo |
| 938 | |a Society of Photo-Optical Instrumentation Engineers |b SPIE |n 9781510617384 | ||
| 938 | |a YBP Library Services |b YANK |n 15357756 | ||
| 938 | |a EBSCOhost |b EBSC |n 1808525 | ||
| 994 | |a 92 |b IZTAP | ||