EUV lithography /

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Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Bakshi, Vivek (Editor )
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Bellingham, Washington, USA : SPIE Press, [2018]
Edición:Second edition.
Colección:SPIE Press monograph ; PM283.
Temas:
Ultraviolet radiation > Industrial applications.
Photolithography.
Optical coatings.
Rayonnement ultraviolet > Applications industrielles.
Photolithographie.
Revêtements optiques.
photolithography.
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Foreword to the second edition
  • Preface to the second edition
  • List of contributors
  • List of acronyms and abbreviations
  • 1. EUV lithography: a historical perspective / Hiroo Kinoshita and Obert Wood
  • 2. The EUV LLC: an historical perspective / Stefan Wurm
  • 3A. EUV sources for high-volume manufacturing / Igor V. Fomenkov, Bruno La Fontaine, David C. Brandt, David W. Myers, Alexander I. Ershov, Alexander A. Schafgans, Yezheng Tao, and Georgiy O. Vaschenko
  • 3B. High-power EUV source by gigaphoton for high-volume manufacturing / Hakaru Mizoguchi, Taku Yamazaki, Tatsuya Yanagida, Krzysztof M. Nowak, and Takashi Saitou
  • 4A. The EQ-10 electrodeless Z-pinch metrology source / Stephen Horne, Matthew M. Besen, Paul A. Blackborow, Ron Collins, Deborah Gustafson, Matthew J. Partlow, and Donald K. Smith
  • 4B. High-radiance LDP source for mask inspection / Yusuke Teramoto
  • 5. Optical systems for EUVl / Sascha Migura, Winfried Kaiser, Jens Timo Neumann, and Hartmut Enkisch
  • 6A. Optics contamination / Charles S. Tarrio, Robert F. Berg, Shannon Hill, and Saša Bajt
  • 6B. Collector contamination: normal-incidence (multilayer) collectors / Daniel T. Elg, Shailendra N. Srivastava, and David N. Ruzic
  • 7. EUV mask and mask metrology / Jinho Ahn and Chan-Uk Jeon
  • 8. Photoresists for EUV lithography / Robert L. Brainard, Gregg Gallatin, Mark Neisser, and Amrit Narasimhan
  • 9. Fundamentals of EUVL scanners / Jan B.P. van Schoot and Hans Jasper
  • 10. EUVL system patterning performance / Patrick Naulleau and Gregg Gallatin
  • Appendix: Reference Data for the EUV Spectral Region / Eric M. Gullikson and David Attwood
  • Index.

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