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Ultra clean processing of semiconductor surfaces XI : selected, peer reviewed papers from the 11th international symposium on ultra clean processing of semiconductor surfaces (UCPSS), September 17-19, 2012, Gent, Belgium /
This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications....
| Clasificación: | Libro Electrónico |
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| Autor Corporativo: | |
| Otros Autores: | , , |
| Formato: | Electrónico Congresos, conferencias eBook |
| Idioma: | Inglés |
| Publicado: |
Durnten-Zurich, Switzerland :
Trans Tech Publications Ltd.,
[2013]
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| Colección: | Diffusion and defect data. Solid state phenomena ;
v. 195. |
| Temas: | |
| Acceso en línea: | Texto completo |
| Sumario: | This volume covers various aspects of ultra-clean technology for the large-scale integration of semiconductors. These include cleaning and contamination control in both front-end-of-line (FEOL) and back-end-of-line (BEOL) processing, as well as cleaning for semiconductor photo-voltaic applications. Also covered are studies of general topics such as particle removal using acoustic enhancement, the removal of metallic contamination, pattern collapse of fine flexible and fragile features, wetting and drying, contamination control and contamination metrology. The FEOL and BEOL contributions also t. |
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| Descripción Física: | 1 online resource (328 pages) : illustrations (black and white) |
| Bibliografía: | Includes bibliographical references and index. |
| ISBN: | 9783038139089 3038139084 9781680151091 1680151096 |
| ISSN: | 1012-0394 ; |
| Acceso: | Access restricted to Ryerson students, faculty and staff. |