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Electromigration in thin films and electronic devices : materials and reliability /

Understanding and limiting electromigration in thin films is essential to the continued development of advanced copper interconnects for integrated circuits. Electromigration in thin films and electronic devices provides an up-to-date review of key topics in this commercially important area. Part on...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Kim, Choong-Un
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Oxford : Woodhead Pub., 2011.
Colección:Woodhead Publishing in materials.
Temas:
Acceso en línea:Texto completo
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Publicado 2011
Texto completo
Electrónico eBook