Principles of lithography /

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The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Levinson, Harry J.
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Bellingham, Wash. : SPIE Press, ©2010.
Edición:3rd ed.
Colección:SPIE monograph ; PM198.
Temas:
Integrated circuits > Design and construction.
Microlithography.
Circuits intégrés > Conception et construction.
Microlithographie.
TECHNOLOGY & ENGINEERING > Mechanical.
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Preface to the third edition
  • Preface to the second edition
  • Preface
  • Chapter 1. Overview of lithography
  • Chapter 2. Optical pattern formation
  • Chapter 3. Photoresists
  • Chapter 4. Modeling and thin-film effects
  • Chapter 5. Wafer steppers
  • Chapter 6. Overlay
  • Chapter 7. Masks and reticles
  • Chapter 8. Confronting the diffraction limit
  • Chapter 9. Metrology
  • Chapter 10. Immersion lithography and the limits of optical lithography
  • Chapter 11. Lithography costs
  • Chapter 12. Extreme ultraviolet lithography
  • Chapter 13. Alternative lithography techniques
  • Appendix A: Coherence.

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