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Principles of lithography /
The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Bellingham, Wash. :
SPIE Press,
©2010.
|
| Edición: | 3rd ed. |
| Colección: | SPIE monograph ;
PM198. |
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 049 | |a UAMI | ||
| 100 | 1 | |a Levinson, Harry J. | |
| 245 | 1 | 0 | |a Principles of lithography / |c Harry J. Levinson. |
| 250 | |a 3rd ed. | ||
| 260 | |a Bellingham, Wash. : |b SPIE Press, |c ©2010. | ||
| 300 | |a 1 online resource (xiv, 503 pages) : |b illustrations (some color) | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Press monograph ; |v 198 | |
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | |a Preface to the third edition -- Preface to the second edition -- Preface -- Chapter 1. Overview of lithography -- Chapter 2. Optical pattern formation -- Chapter 3. Photoresists -- Chapter 4. Modeling and thin-film effects -- Chapter 5. Wafer steppers -- Chapter 6. Overlay -- Chapter 7. Masks and reticles -- Chapter 8. Confronting the diffraction limit -- Chapter 9. Metrology -- Chapter 10. Immersion lithography and the limits of optical lithography -- Chapter 11. Lithography costs -- Chapter 12. Extreme ultraviolet lithography -- Chapter 13. Alternative lithography techniques -- Appendix A: Coherence. | |
| 520 | |a The publication of Principles of Lithography, Third Edition just five years after the previous edition is evidence of the quickly changing and exciting nature of lithography as applied to the production of integrated circuits and other micro- and nanoscale devices. This text is intended to serve as an introduction to the science of microlithography, but also covers several subjects in depth, making it useful to the experienced lithographer as well. Topics directly related to manufacturing tools are addressed, including overlay, the stages of exposure, tools, and light sources. This updated edition reflects recent advances in technology, including the shift of immersion lithography from development into volume manufacturing, and the movement of EUV lithography from the lab to development pilot lines. New references and homework problems are included. It is expected that the reader of this book will have a foundation in basic physics and chemistry. No topics will require knowledge of mathematics beyond elementary calculus. | ||
| 546 | |a English. | ||
| 590 | |a Knovel |b ACADEMIC - Optics & Photonics | ||
| 650 | 0 | |a Integrated circuits |x Design and construction. | |
| 650 | 0 | |a Microlithography. | |
| 650 | 6 | |a Circuits intégrés |x Conception et construction. | |
| 650 | 6 | |a Microlithographie. | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Mechanical. |2 bisacsh | |
| 650 | 7 | |a Integrated circuits |x Design and construction. |2 fast |0 (OCoLC)fst00975545 | |
| 650 | 7 | |a Microlithography. |2 fast |0 (OCoLC)fst01019883 | |
| 776 | 0 | 8 | |i Print version: |a Levinson, Harry J. |t Principles of lithography. |b 3rd ed. |d Bellingham, Wash. : SPIE Press, ©2010 |z 9780819483249 |w (DLC) 2010026775 |w (OCoLC)647976639 |
| 830 | 0 | |a SPIE monograph ; |v PM198. | |
| 856 | 4 | 0 | |u https://appknovel.uam.elogim.com/kn/resources/kpPLE00005/toc |z Texto completo |
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