|
|
|
|
LEADER |
00000cam a2200000Ia 4500 |
001 |
KNOVEL_ocn743217551 |
003 |
OCoLC |
005 |
20231027140348.0 |
006 |
m o d |
007 |
cr cn||||||||| |
008 |
110728s2008 nyua ob 001 0 eng d |
040 |
|
|
|a KNOVL
|b eng
|e pn
|c KNOVL
|d OCLCQ
|d DEBSZ
|d OCLCQ
|d KNOVL
|d ZCU
|d KNOVL
|d OCLCF
|d OCLCO
|d COO
|d KNOVL
|d CNNAI
|d OCLCQ
|d VT2
|d UAB
|d BUF
|d OCLCQ
|d CEF
|d RRP
|d AU@
|d WYU
|d YOU
|d OCLCQ
|d ERF
|d OCLCO
|d OCLCQ
|d OCL
|d OCLCO
|
016 |
7 |
|
|a 014625076
|2 Uk
|
019 |
|
|
|a 748339450
|a 858447343
|a 961884888
|a 988635253
|a 999445003
|a 1058076207
|a 1065708099
|
020 |
|
|
|a 9781613441107
|q (electronic bk.)
|
020 |
|
|
|a 161344110X
|q (electronic bk.)
|
020 |
|
|
|a 9780195320176
|q (pbk. ;
|q alk. paper)
|
020 |
|
|
|a 0195320174
|q (pbk. ;
|q alk. paper)
|
024 |
8 |
|
|a 99938605354
|
029 |
1 |
|
|a AU@
|b 000047731628
|
029 |
1 |
|
|a DEBSZ
|b 349582475
|
029 |
1 |
|
|a GBVCP
|b 83019049X
|
029 |
1 |
|
|a NZ1
|b 14231881
|
029 |
1 |
|
|a NZ1
|b 15621638
|
029 |
1 |
|
|a AU@
|b 000070675725
|
035 |
|
|
|a (OCoLC)743217551
|z (OCoLC)748339450
|z (OCoLC)858447343
|z (OCoLC)961884888
|z (OCoLC)988635253
|z (OCoLC)999445003
|z (OCoLC)1058076207
|z (OCoLC)1065708099
|
037 |
|
|
|b Knovel Corporation
|n http://www.knovel.com
|
050 |
|
4 |
|a TK7871.85
|b .C25 2008eb
|
082 |
0 |
4 |
|a 621.3815/2
|2 22
|
049 |
|
|
|a UAMI
|
100 |
1 |
|
|a Campbell, Stephen A.,
|d 1954-
|
245 |
1 |
0 |
|a Fabrication engineering at the micro and nanoscale /
|c Stephen A. Campbell.
|
250 |
|
|
|a 3rd ed.
|
260 |
|
|
|a New York :
|b Oxford University Press,
|c 2008.
|
300 |
|
|
|a 1 online resource (xiv, 647 pages) :
|b illustrations
|
336 |
|
|
|a text
|b txt
|2 rdacontent
|
337 |
|
|
|a computer
|b c
|2 rdamedia
|
338 |
|
|
|a online resource
|b cr
|2 rdacarrier
|
490 |
1 |
|
|a The Oxford series in electrical and computer engineering
|
504 |
|
|
|a Includes bibliographical references and index.
|
505 |
0 |
|
|a An introduction to microelectronic fabrication -- Semiconductor substrates -- Diffusion -- Thermal Oxidation -- Ion Implantation -- Rapid thermal processing -- Optical lithography -- Photoresists -- Nonoptical lithographic techniques -- Vacuum Science and plasmas -- Etching -- Physical deposition: evaporation and sputtering -- Chemical vapor deposition -- Epitaxial growth -- Device isolation, contacts, and metalization -- CMOS technologies -- Other transistor technologies -- Optoelectronic technologies -- MEMS -- Integrated circuit manufacturing.
|
588 |
0 |
|
|a Print version record.
|
546 |
|
|
|a English.
|
590 |
|
|
|a Knovel
|b ACADEMIC - Electronics & Semiconductors
|
650 |
|
0 |
|a Semiconductors
|x Design and construction.
|
650 |
|
0 |
|a Semiconductors
|x Mathematical models.
|
650 |
|
0 |
|a Microelectronics.
|
650 |
|
0 |
|a Nanoelectronics.
|
650 |
|
2 |
|a Miniaturization
|
650 |
|
6 |
|a Semi-conducteurs
|x Conception et construction.
|
650 |
|
6 |
|a Semi-conducteurs
|x Modèles mathématiques.
|
650 |
|
6 |
|a Microélectronique.
|
650 |
|
6 |
|a Nanoélectronique.
|
650 |
|
7 |
|a microelectronics.
|2 aat
|
650 |
|
7 |
|a Nanoelectronics
|2 fast
|
650 |
|
7 |
|a Microelectronics
|2 fast
|
650 |
|
7 |
|a Semiconductors
|x Design and construction
|2 fast
|
650 |
|
7 |
|a Semiconductors
|x Mathematical models
|2 fast
|
700 |
1 |
|
|a Campbell, Stephen A.,
|d 1954-
|t Science and engineering of microelectronic fabrication.
|
776 |
0 |
8 |
|i Print version:
|a Campbell, Stephen A., 1954-
|t Fabrication engineering at the micro and nanoscale.
|b 3rd ed.
|d New York : Oxford University Press, 2008
|z 0195320174
|w (DLC) 2007013450
|w (OCoLC)122338108
|
830 |
|
0 |
|a Oxford series in electrical and computer engineering.
|
856 |
4 |
0 |
|u https://appknovel.uam.elogim.com/kn/resources/kpFEMNE001/toc
|z Texto completo
|
994 |
|
|
|a 92
|b IZTAP
|