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Lithography process control /
This text covers lithography process control at several levels, from fundamental through advanced topics. The book is a self-contained tutorial that works both as an introduction to the technology and as a reference for the experienced lithographer. It reviews the foundations of statistical process...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Bellingham, Wash. :
SPIE Optical Engineering Press,
©1999.
|
| Colección: | Tutorial texts in optical engineering ;
v. TT 28. |
| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- ch. 1. Introduction to the use of statistical process control in lithography
- ch. 2. Sampling
- ch. 3. Simple and complex processes
- ch. 4. Linewidth control
- ch. 5. Overlay
- ch. 6. Yield
- ch. 7. Process drift and automatic process control
- ch. 8. Metrology
- ch. 9. Control of operations.
- 1. Introduction to the use of statistical process control in lithography
- The assumptions underlying statistical process control
- The properties of statistical process control
- Situations in lithography where statistical process control cannot be applied naively
- Non-normal distributions
- Process capability
- 2. Sampling
- Choosing the proper sample size
- Measurement location considerations
- Correlations
- Measurement frequency
- Systematic sources of variation
- 3. Simple and complex processes
- Definitions
- Why test wafers are useful
- How to address complex processes in lithography
- Distinguishing between layer-specific and equipment-specific effects
- 4. Linewidth control
- Cause and effect
- Independent variables
- Exposure dose
- Resist thickness
- Focus
- Bake temperatures
- Resist development
- Humidity
- DUV resists--special considerations
- Contributions from reticles
- Maximizing the process window
- 5. Overlay
- Overlay models
- Matching
- Contributions from processing and alignment mark optimization
- Addressing the problem of non-normal distributions
- Outliers
- 6. Yield
- Yield monitor strategy
- Yield models
- Parameters which affect yield
- 7. Process drift and automatic process control
- Adjusting for process drift
- The exponentially-weighted moving average
- Automatic process control
- 8. Metrology
- The need for understanding the measurement process: defect detection
- Linewidth measurement using scanning electron microscopes
- Electrical linewidth measurement
- Measurement error budgets
- Measurement of overlay
- 9. Control of operations
- Self-control
- Documentation
- ISO 9000.