Resolution enhancement techniques in optical lithography /

Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolutio...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Wong, Alfred Kwok-Kit
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Bellingham, Wash. : SPIE Press, ©2001.
Colección:Tutorial texts in optical engineering ; v. TT 47.
Temas:
Integrated circuits > Design and construction.
Microlithography.
Circuits intégrés > Conception et construction.
Microlithographie.
Integrierte Schaltung
Lithografie > Halbleitertechnologie
Circuits imprimés > Conception et construction.
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Foreword
  • Preface-- List of symbols
  • 1. Introduction. 1.1 Brief history of printing and lithography. 1.2 Optical lithography and integrated circuits. 1.3 Basics of optical lithography. 1.4 Requirements of microlithography. 1.5 Nonoptical microlithography techniques. 1.6 Current challenges of optical microlithography. 1.7 Three parameters affecting resolution. 1.8 Scope of discussion
  • 2. Optical imaging and resolution. 2.1 Coherent imaging. 2.2 Mask spectrum. 2.3 Partially coherent imaging. 2.4 Complex degree of coherence. 2.5 Rayleigh's resolution limit. 2.6 Lithography resolution limit. 2.7 Quantification of image quality.
  • 3. Modified illumination. 3.1 Partial coherence factor. 3.2 Off-axis illumination. 3.3 General guidelines
  • 4. Optical proximity correction. 4.1 Image distortion. 4.2 Optical proximity correction approaches. 4.3 Numerical techniques. 4.4 Implementation. 4.5 Discussion
  • 5. Alternating phase-shifting mask. 5.1 Principle. 5.2 Mask making process. 5.3 Issues. 5.4 Implementation. 5.5 Summary
  • 6. Attenuated phase-shift mask. 6.1 Principle. 6.2 Mask making. 6.3 Discussion
  • 7. Selecting appropriate RETs. 7.1 Critical levels. 7.2 Methodology. 7.3 Optimization results. 7.4 Summary and discussion
  • 8 Second-Generation RETs. 8.1 Multiple exposure. 8.2 Pupil filtering. 8.3 Advanced illumination scheme. 8.4 Compensating process. 8.5 Mask and photoresist tone
  • Concluding remarks
  • k1 conversion charts
  • Bibliography
  • Index.

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