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Resolution enhancement techniques in optical lithography /
Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolutio...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Bellingham, Wash. :
SPIE Press,
©2001.
|
| Colección: | Tutorial texts in optical engineering ;
v. TT 47. |
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
| LEADER | 00000cam a2200000 a 4500 | ||
|---|---|---|---|
| 001 | KNOVEL_ocn694903648 | ||
| 003 | OCoLC | ||
| 005 | 20231027140348.0 | ||
| 006 | m o d | ||
| 007 | cr cn||||||||| | ||
| 008 | 110104s2001 waua ob 001 0 eng d | ||
| 040 | |a KNOVL |b eng |e pn |c KNOVL |d OCLCQ |d OCLCO |d KNOVL |d OCLCF |d J2I |d CEF |d SPIES |d EBLCP |d KNOVL |d YDXCP |d OCLCQ |d MERUC |d AU@ |d OCLCQ |d OCLCO |d UKBTH |d OCLCQ |d LUN |d OCLCQ |d UIU |d OCLCO |d OCLCQ | ||
| 019 | |a 435971873 |a 1058153932 | ||
| 020 | |a 9781615837328 |q (electronic bk.) | ||
| 020 | |a 1615837329 |q (electronic bk.) | ||
| 020 | |a 9780819478818 |q (electronic) | ||
| 020 | |a 0819478814 |q (electronic) | ||
| 020 | |z 0819439959 |q (print) | ||
| 020 | |z 9780819439956 |q (print) | ||
| 024 | 7 | |a 10.1117/3.401208 |2 doi | |
| 029 | 1 | |a AU@ |b 000045655319 | |
| 029 | 1 | |a AU@ |b 000048592863 | |
| 029 | 1 | |a AU@ |b 000051589009 | |
| 029 | 1 | |a AU@ |b 000062603854 | |
| 029 | 1 | |a GBVCP |b 1018189297 | |
| 029 | 1 | |a GBVCP |b 856586692 | |
| 029 | 1 | |a NZ1 |b 13245936 | |
| 029 | 1 | |a NZ1 |b 14228647 | |
| 029 | 1 | |a NZ1 |b 15619315 | |
| 029 | 1 | |a AU@ |b 000072996749 | |
| 035 | |a (OCoLC)694903648 |z (OCoLC)435971873 |z (OCoLC)1058153932 | ||
| 037 | |b Knovel Corporation |n http://www.knovel.com | ||
| 050 | 4 | |a TK7874 |b .W647 2001eb | |
| 082 | 0 | 4 | |a 621.3815/31 |2 22 |
| 084 | |a ZN 4170 |2 rvk | ||
| 049 | |a UAMI | ||
| 100 | 1 | |a Wong, Alfred Kwok-Kit. | |
| 245 | 1 | 0 | |a Resolution enhancement techniques in optical lithography / |c Alfred Kwok-Kit Wong. |
| 260 | |a Bellingham, Wash. : |b SPIE Press, |c ©2001. | ||
| 300 | |a 1 online resource (xvii, 214 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Tutorial texts in optical engineering ; |v v. TT 47 | |
| 504 | |a Includes bibliographical references (pages 189-208) and index. | ||
| 505 | 0 | |a Foreword -- Preface-- List of symbols -- 1. Introduction. 1.1 Brief history of printing and lithography. 1.2 Optical lithography and integrated circuits. 1.3 Basics of optical lithography. 1.4 Requirements of microlithography. 1.5 Nonoptical microlithography techniques. 1.6 Current challenges of optical microlithography. 1.7 Three parameters affecting resolution. 1.8 Scope of discussion -- 2. Optical imaging and resolution. 2.1 Coherent imaging. 2.2 Mask spectrum. 2.3 Partially coherent imaging. 2.4 Complex degree of coherence. 2.5 Rayleigh's resolution limit. 2.6 Lithography resolution limit. 2.7 Quantification of image quality. -- 3. Modified illumination. 3.1 Partial coherence factor. 3.2 Off-axis illumination. 3.3 General guidelines -- 4. Optical proximity correction. 4.1 Image distortion. 4.2 Optical proximity correction approaches. 4.3 Numerical techniques. 4.4 Implementation. 4.5 Discussion -- 5. Alternating phase-shifting mask. 5.1 Principle. 5.2 Mask making process. 5.3 Issues. 5.4 Implementation. 5.5 Summary -- 6. Attenuated phase-shift mask. 6.1 Principle. 6.2 Mask making. 6.3 Discussion -- 7. Selecting appropriate RETs. 7.1 Critical levels. 7.2 Methodology. 7.3 Optimization results. 7.4 Summary and discussion -- 8 Second-Generation RETs. 8.1 Multiple exposure. 8.2 Pupil filtering. 8.3 Advanced illumination scheme. 8.4 Compensating process. 8.5 Mask and photoresist tone -- Concluding remarks -- k1 conversion charts -- Bibliography -- Index. | |
| 520 | |a Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers. | ||
| 588 | 0 | |a Print version record. | |
| 590 | |a Knovel |b ACADEMIC - Optics & Photonics | ||
| 650 | 0 | |a Integrated circuits |x Design and construction. | |
| 650 | 0 | |a Microlithography. | |
| 650 | 6 | |a Circuits intégrés |x Conception et construction. | |
| 650 | 6 | |a Microlithographie. | |
| 650 | 7 | |a Integrated circuits |x Design and construction. |2 fast |0 (OCoLC)fst00975545 | |
| 650 | 7 | |a Microlithography. |2 fast |0 (OCoLC)fst01019883 | |
| 650 | 7 | |a Integrierte Schaltung |2 gnd | |
| 650 | 7 | |a Lithografie |g Halbleitertechnologie |2 gnd | |
| 650 | 7 | |a Circuits imprimés |x Conception et construction. |2 ram | |
| 650 | 7 | |a Microlithographie. |2 ram | |
| 776 | 0 | 8 | |i Print version: |a Wong, Alfred Kwok-Kit. |t Resolution enhancement techniques in optical lithography. |d Bellingham, Wash. : SPIE Press, ©2001 |z 0819439959 |w (DLC) 2001020028 |w (OCoLC)45879722 |
| 830 | 0 | |a Tutorial texts in optical engineering ; |v v. TT 47. | |
| 856 | 4 | 0 | |u https://appknovel.uam.elogim.com/kn/resources/kpRETOL001/toc |z Texto completo |
| 938 | |a ProQuest Ebook Central |b EBLB |n EBL728569 | ||
| 938 | |a Society of Photo-Optical Instrumentation Engineers |b SPIE |n 9780819478818 | ||
| 938 | |a YBP Library Services |b YANK |n 9339744 | ||
| 994 | |a 92 |b IZTAP | ||