Resolution enhancement techniques in optical lithography /

Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolutio...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Wong, Alfred Kwok-Kit
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Bellingham, Wash. : SPIE Press, ©2001.
Colección:Tutorial texts in optical engineering ; v. TT 47.
Temas:
Integrated circuits > Design and construction.
Microlithography.
Circuits intégrés > Conception et construction.
Microlithographie.
Integrierte Schaltung
Lithografie > Halbleitertechnologie
Circuits imprimés > Conception et construction.
Acceso en línea:Texto completo
Descripción
Sumario:Ever-smaller IC devices are pushing the optical lithography envelope, increasing the importance of resolution enhancement techniques. This tutorial encompasses two decades of research. It discusses theoretical and practical aspects of commonly used techniques, including optical imaging and resolution, modified illumination, optical proximity correction, alternating and attenuating phase-shifting masks, selecting RETs, and second-generation RETs. Useful for students and practicing lithographers.
Descripción Física:1 online resource (xvii, 214 pages) : illustrations
Bibliografía:Includes bibliographical references (pages 189-208) and index.
ISBN:9781615837328
1615837329
9780819478818
0819478814

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