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Developments in surface contamination and cleaning : particle deposition, control and removal /

Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Kohli, Rajiv, 1947-, Mittal, K. L., 1945-
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Amsterdam ; Boston : Elsevier/William Andrew, ©2010.
Temas:
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Particle Deposition onto Enclosure Surfaces; Contamination Control: A Systems Approach; Particles in Semiconductor Processing; Continuous Contamination Monitoring Systems; Strippable Coatings for Removal of Surface Contaminants; Ultrasonic Cleaning.
  • [V. 1.] Fundamentals and applied aspects
  • v. 2. Particle deposition, control and removal.