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EUV sources for lithography /

This comprehensive volume, edited by a senior technical staff member at SEMATECH, is the authoritative reference book on EUV source technology. The volume contains 38 chapters contributed by leading researchers and suppliers in the EUV source field. Topics range from a state-of-the-art overview and...

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Detalles Bibliográficos
Clasificación:	Libro Electrónico
Autor Corporativo:	Society of Photo-Optical Instrumentation Engineers
Otros Autores:	Bakshi, Vivek
Formato:	Electrónico eBook
Idioma:	Inglés
Publicado:	Bellingham, Wash. : SPIE, ©2006.
Colección:	SPIE monograph ; PM149.
Temas:	Ultraviolet radiation > Industrial applications. Extreme ultraviolet lithography. Plasma (Ionized gases) Lithography. Rayonnement ultraviolet > Applications industrielles. Lithographie par ultraviolets extrêmes. Plasma (Gaz ionisés) Lithographie. lithography. TECHNOLOGY & ENGINEERING > Mechanical. Extreme ultraviolet lithography Lithography Ultraviolet radiation > Industrial applications
Acceso en línea:	Texto completo

Tabla de Contenidos:

Preface / Vivek Bakshi
Introduction / Kevin Kemp
List of contributors
List of abbreviations.
Section I. Introduction and technology review
Chapter 1. EUV source technology: challenges and status / Vivek Bakshi
1.1. Introduction
1.2. Conversion efficiency of EUV sources
1.3. EUV source power
1.4. Source components and their lifetimes
1.5. Summary and future outlook
References.
Chapter 2. EUV source requirements for EUV lithography / Kazuya Ota, Yutaka Watanabe, Vadim Banine, and Hans Franken
2.1. Introduction and background
2.2 Source requirements
2.3. Component degradation
2.4. Cost of ownership
2.5. Conclusions
Acknowledgments
References.
Section II. Fundamentals and modeling
Chapter 3. Atomic Xenon data / John D. Gillaspy
3.1. Introduction
3.2. Specification of the subtypes of fundamental atomic data needed
3.3. Overview and current status of available data for Xenon (q=7 to q=18)
3.4. References to data for the less-critical charge states (q<7 or q>18) of Xenon
3.5. Benchmarking input data
3.6. Benchmarking output data
3.7. Outlook and future data needs
Acknowledgments
References (for main text)
Appendix A: International SEMATECH's fundamental data
Working group
Appendix B: Xenon atomic data.
Chapter 4. Atomic tin data / I. Yu. Tolstikhina, S.S. Churilov, A.N. Ryabtsev, and K.N. Koshelev
4.1. Introduction
4.2. Theoretical approach
4.3. Results of the calculations
4.4. Registration of Sn plasma spectra
4.5. Primary classification on charge states
4.6. Conclusion
Acknowledgments
Appendix: Results of theoretical calculations of Sn ion spectra
References.
Chapter 5. Atomic physics of highly charged ions and the case for Sn as a source material / Gerry O'Sullivan, Anthony Cummings, Padraig Dunne, Patrick Hayden, Luke McKinney, Nicola Murphy, and John White
5.1. Introduction and background
5.2. The case for Xenon
5.3. Alternatives to Xenon; the case for Tin
5.4. Conclusions
Acknowledgments
References.
Chapter 6. Radiative collapse in Z pinches / K.N. Koshelev, H.-J. Kunze, R. Gayazov, V. Gomozov, V.V. Ivanov, V.G. Koloshnikov, E.D. Korop, V. Krivtsun, Yu. V. Sidelnikov, O. Yakushev, and G.G. Zukakishvili
6.1. Introduction
6.2. Formation of pinch columns
6.3. Discharge source for EUVL: high-power, high-CE alternative concept source
6.4. Neck instabilities in pinch plasmas: radiative collapse
6.5. Plasma-column energy balance; Pease-Braginskii current; critical current for heavy-ion plasmas
6.6. Neck development scenario
6.7. Experimental observation of neck instabilities; plasma outflow
6.8. Dissipation of electrical energy in the discharge
6.9. Equilibrium radius; EUV source size
6.10. Equilibrium radius versus linear density trajectory
6.11. Stability of radiative-collapse trajectory, EUV yield, and shot-to-shot reproducibility
6.12. Axial size of the EUV source; zippering effect
6.13. Conclusions
Acknowledgments
References.
Chapter 7. Fundamentals and limits of plasma-based EUV sources / Rainer Lebert, Thomas Krücken, and H.-J. Kunze
7.1. Introduction
7.2. Required parameters of EUV sources
7.3. Fundamental limits
7.4. Fundamental processes
7.5. Factors influencing the radiative yield
7.6. Plasma simulation: tool for source optimization
7.7. Atomic physics, radiation, and ionization modeling
7.8. MHD description of the pinch phase of the discharge
7.9. Other important issues
Acknowledgments
References.
Chapter 8. Z code for DPP and LPP source modeling / Sergey V. Zakharov, Vladimir G. Novikov, and Peter Choi
8.1. Introduction
8.2. Fundamentals of the physics of EUV-emitting plasmas
8.3. Computational RMHD code Z
8.4. EUV radiation source simulations
8.5. Summary
Acknowledgments
Appendix A. Analytical solution for the axially inhomogenous capillary discharge
Appendix B. Estimations for the motion dynamics of a sheath in the ionized gas via the snowplow model
Appendix C. Calculation of the laser energy transport process
References.
Chapter 9. HEIGHTS-EUV package for DPP source modeling / A. Hassanein, V. Morozov, V. Sizyuk, V. Tolkach, and B. Rice
9.1. Introduction
9.2. Magnetohydrodynamics
9.3. External electric circuit
9.4. Detailed radiation transport
9.5. Atomic physics and opacities
9.6. Results and discussion
9.7. Conclusion
Acknowledgments
References.
Chapter 10. Modeling LPP sources / Moza Al-Rabban, Martin Richardson, Howard Scott, Franck Gilleron, Michel Poirier, and Thomas Blenski
10.1. Introduction
10.2. EUVL source requirements
10.3. Physical processes in laser plasmas
10.4. Modeling laser-target interactions and plasma expansion
10.5. Atomic physics modeling of laser plasmas
10.6. Future trends
Acknowledgments
References.
Chapter 11. Conversion efficiency of LPP sources / Katsunobu Nishihara, Akira Sasaki, Atsushi Sunahara, and Takeshi Nishikawa
11.1. Introduction
11.2. Design window for practical use
11.3. Power balance model
11.4. Atomic models and radiation hydrodynamic code
11.5. Conversion efficiency for tin and Xenon
11.6. Discussion and summary
Acknowledgments
References.
Section III. Plasma pinch sources
Chapter 12. Dense plasma focus source / Igor V. Fomenkov, William N. Partlo, Norbert R. Böwering, Oleg V. Khodykin, Curtis L. Rettig, Richard M. Ness, Jerzy R. Hoffman, Ian R. Oliver, and Stephan T. Melnychuk
12.1. Introduction
12.2. Overview of the source
12.3. Pulsed-power development
12.4. EUV output energy and conversion efficiency
12.5. Operation at high repetition rates
12.6. Thermal management
12.7. EUV source size and spatial and angular distribution
12.8. EUV spectra
12.9. Spectral and plasma modeling
12.10. Metal target elements
12.11. Debris mitigation and contamination studies
12.12. EUV collector
12.13. Lifetime limitations and power scaling
12.14. Summary and conclusion
Acknowledgments
References.
Chapter 13. Hollow-cathode-triggered plasma pinch discharge / Joseph Pankert, Klaus Bergmann, Rolf Wester, Jürgen Klein, Willi Neff, Oliver Rosier, Stefan Seiwert, Christopher Smith, Sven Probst, Dominik Vaudrevange, Guido Siemons, Rolf Apetz, Jeroen Jonkers, Michael Loeken, Günther Derra, Thomas Krücken, and Peter Zink
13.1. Introduction
13.2. Physics of EUV sources based on hollow-cathode-triggered gas discharges
13.3. The Philips HCT source: design and results
13.4. Summary and outlook
Acknowledgments
References.
Chapter 14. High-power GDPP Z-pinch EUV source technology / Uwe Stamm, Guido Schriever, and Jürgen Kleinschmidt
14.1. Introduction
14.2. Physics of the Z-pinch discharge and EUV generation
14.3. Emitter materials for 13.5-nm Z-pinch sources
14.4. Discharge electrode system, source collector, and electrode lifetime
14.5. Pulsed power excitation of Z pinches
14.6. Discharge-electrode thermal management technology
14.7. Debris mitigation and collector-optics protection
14.8. First commercial sources for exposure tools, EUV source XTS 13-35
14.9. Scaling of Z-pinch power and lifetime performance to [beta]-tool and HVM requirements
14.10. Path to meet remaining challenges for HVM GDPP sources, lifetime improvement of discharge electrode system and source collector optics for tin fuel
14.11. Summary and conclusion
Acknowledgments
References.
Chapter 15. Star pinch EUV source / Malcolm W. McGeoch
15.1. Generic EUV source factors
15.2. Directed discharges
15.3. Current star pinch performance
15.4. Scaling to high-volume manufacturing
References.
Chapter 16. Xenon and tin pinch discharge sources / Vladimir M. Borisov, Andrey I. Demin, Alexander V. Eltsov, Alexander S. Ivanov, Yuriy B. Kiryukhin, Oleg B. Khristoforov, Valentin A. Mishchenko, Alexander V. Prokofiev, Alexander Yu. Vinokhodov, and Vladimir A. Vodchits
16.1. Introduction
16.2. Pinch effect
16.3. EUV source using Xe
16.4. Some approaches to meet HVM requirements
16.5. Pinch discharges based on Sn vapor and gas mixtures
16.6. Excimer-laser-initiated pinch discharge in Sn
16.7. Conclusions
Acknowledgments
References.
Chapter 17. Capillary Z-pinch source / Yusuke Teramoto, Hiroto Sato, and Masaki Yoshioka
17.1. Introduction
17.2. Discharge head and magnetic pulse compression generator
17.3. Diagnostics
17.4. Experimental results
17.5. Conclusions
Acknowledgments
References.
Chapter 18. Plasma capillary source / Željko Andreic, Samir Ellwi, and H.-J. Kunze
18.1. Introduction
18.2. Theoretical modeling
18.3. Gas-filled capillaries
18.4. Ablative capillary discharges
18.5. Different additives
18.6. Conclusion
Acknowledgments
References.
Section IV. Laser-produced plasma (LPP) sources
Chapter 19. Technology for LPP sources / Uwe Stamm and Kai Gäbel
19.1. Introduction
19.2. Physics of LPP-based EUV generation
19.3. Laser target modifications and target handling
19.4. Laser-driver technology for LPP EUV sources
19.5. CE and output power, experimental data
19.6. Etendue, source size, and source collector
19.7. Scaling of performance to HVM
19.8. Summary and conclusion
Acknowledgments
References.
Chapter 20. Spatially and temporally multiplexed laser modules for LPP sources / Samir Ellwi, Andrew J. Comley, and Michael Brownell
20.1. Introduction
20.2. Laser technology
20.3. Target design and vacuum environment
20.4. Conclusion
Acknowledgments
References.
Chapter 21. Modular LPP source / Martin Schmidt, Benoit Barthod, Tibério Ceccotti, Guy Cheymol, Jean-François Hergott, Olivier Sublemontier, Pierre-Yves Thro, Philippe Cormont, Jacky Skrzypczak, and Thierry Auguste
21.1. Introduction
21.2. Designing a modular LPP source
21.3. The ELSAC LPP source developed by Exulite
21.4. Conclusion
Acknowledgments
References.
Chapter 22. Driver laser, Xenon target, and system development for LPP sources / Akira Endo
22.1. Introduction
22.2. High-power driver laser
22.3. Xenon targets
22.4. Light-source EUV characteristics
22.5. Summary
Acknowledgment
References.
Chapter 23. Liquid-Xenon-Jet LPP source / Björn A.M. Hansson and Hans M. Hertz
23.1. Introduction
23.2. Liquid-Xenon-Jet laser plasma generation
23.3. Source requirements and design example
23.4. Source characterization
23.5. Lifetime
23.6. Summary
Acknowledgments
References.
Chapter 24. LPP source development and operation in the engineering test stand / John E.M. Goldsmith, Glenn D. Kubiak, and William P. Ballard
24.1. Introduction
24.2. Early source development at Sandia
24.3. ETS source development
24.4. Integration of the high-power source into the ETS
24.5. ETS operation with the high-power source
24.6. Conclusion
Acknowledgments
References.
Chapter 25. Xenon target and high-power laser module development for LPP sources / Richard Moyer, Harry Shields, Steven Fornaca, Randall St. Pierre, Armando Martos, James Zamel, Fernando Martos, Samuel Ponti, R.D. McGregor, Mark Michaelian, Jeffrey Hartlove, Stuart McNaught, Lawrence Iwaki, Rocco Orsini, Michael Petach, Mark Thomas, Armando Villarreal, and Vivek Bakshi
25.1. Introduction
25.2. Laser module
25.3. Xenon target development
25.4. System development and performance
25.5. Conclusions
Acknowledgments
References.
Chapter 26. Laser plasma EUV sources based on droplet target technology / Martin Richardson, Chiew-Seng Koay, Kazutoshi Takenoshita, Christian Keyser, Simi George, Moza Al-Rabban, and Vivek Bakshi
26.1. Introduction
26.2. Laser interaction with mass-limited spherical targets
26.3. Plasma dynamics of droplet laser plasmas
26.4. EUV emission from laser plasma droplet sources
26.5. Ion emission from droplet laser plasmas
26.6. Particle emission from laser plasmas
26.7. Inhibition of ion and particle emission
26.8. High-power and long-life target scenarios
26.9. Summary
Acknowledgments
References.
Section V. EUV source metrology
Chapter 27. Flying circus EUV source metrology and source development assessment / Fred Bijkerk, Santi Alonso van der Westen, Caspar Bruineman, Robert Huiting, René de Bruijn, and Remko Stuik
27.1. Historical overview of metrology development and standardization
27.2. Metrology concept
27.3. EUV source metrology calibration procedures
27.4. FC source progress assessment
27.5. Diagnostic extensions and new developments
27.6. Summary and future directions
Acknowledgments
References.
Chapter 28. Plasma diagnostic techniques / Eric C. Benck
28.1. Introduction
28.2. Surface accumulators
28.3. Plasma imaging
28.4. Electron diagnostics
28.5. Ion diagnostics
28.6. Neutral-atom detectors
28.7. Summary
Acknowledgments
References.
Chapter 29. Metrology for EUVL sources and tools / Steve Grantham, Charles Tarrio, Robert Vest, and Thomas Lucatorto
29.1. Introduction
29.2. NIST EUV sources for metrology
29.3. Inband EUV power instrumentation
29.4. Reflectometry
29.5. Detector characterization
29.6. Calibration of EUV radiometry tools
29.7. Conclusion
References.
Chapter 30. Calibration of detectors and tools for EUV-source metrology / Frank Scholze and Gerhard Ulm
30.1. Introduction
30.2. Synchrotron radiation beamlines for EUV metrology
30.3. Instrumentation for detector calibration and optics characterization
30.4. Semiconductor photodiodes as reference detector standards
30.5. Spectrally filtered tools and spectrographs
30.6. Conclusions and future needs
Acknowledgments
References.
Section VI. Other types of EUV sources
Chapter 31. Electron-based EUV sources for at-wavelength metrology / André Egbert and Boris N. Chichkov
31.1. The EUV tube, an old solution for new applications
31.2. Characteristics of the EUV tube
31.3. Applications of the EUV tube
31.4. Summary and outlook
Acknowledgments
References.
Chapter 32. Synchrotron radiation sources for EUVL applications / Obert R. Wood, II and Alastair A. MacDowell
32.1. Electron storage rings and synchrotron radiation
32.2. Characteristics of synchrotron radiation
32.3. Survey of current synchrotron radiation facilities
32.4. Selected applications of synchrotron radiation in EUVL
32.5. Conclusions and suggestions for future work
References.
Section VII. EUV source components
Chapter 33. Grazing-incidence EUV collectors / Piotr Marczuk and Wilhelm Egle
33.1. Introduction
33.2. EUV collectors: general considerations
33.3. Grazing-incidence EUV collectors
33.4. Summary, trends, and challenges
Acknowledgments
References.
Chapter 34. Collection efficiency of EUV sources / Günther Derra and Wolfgang Singer
34.1. Introduction
34.2. Etendue of illumination systems
34.3. Determination of EUV source power
34.4. Example measurements at the HCT pinch
34.5. Conclusions
Acknowledgments
References.
Chapter 35. Electrode and condenser materials for plasma pinch sources / A. Hassanein, J.P. Allain, T. Burtseva, Z. Insepov, J.N. Brooks, I. Konkashbaev, V. Morozov, V. Sizyuk, V. Tolkach, T. Sizyuk, B. Rice, V. Safronov, and V. Bakshi
35.1. Introduction
35.2. Electrode thermal response
35.3. Materials selection for plasma pinch sources
35.4. Testing of materials in plasma-gun facilities
35.5. Modeling and testing condenser-optic response
35.6. Conclusions
References.
Chapter 36. Origin of debris in EUV sources and its mitigation / David N. Ruzic
36.1. Introduction
36.2. Source terms
36.3. Standard mitigation techniques
36.4. Mitigation through plasma-based secondary ionization
36.5. Mitigation through manipulating the optical elements
Acknowledgments
References.
Chapter 37. Erosion of condenser optics exposed to EUV sources / Leonard E. Klebanoff, Richard J. Anderson, Dean A. Buchenauer, Neal R. Fornaciari, and Hiroshi Komori
37.1. Introduction
37.2. Early work on condenser erosion
37.3. Condenser erosion observations in the ETS
37.4. Condenser erosion study systems after the ETS
37.5. Erosion studies of EUVA
37.6. Work in other laboratories
Acknowledgments
References.
Chapter 38. Potential energy sputtering of EUVL materials / Joshua M. Pomeroy, Laura P. Ratliff, John D. Gillaspy, and Saa Bajt
38.1. Introduction
38.2. Interactions of HCIs with solids
38.3. Experimental studies of PE damage to EUVL devices
38.4. Implications and outlook
38.5. Summary
Acknowledgments
References
Index.

EUV sources for lithography /

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