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Nanofabrication : fundamentals and applications /

Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is v...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Tseng, A. A. (Ampere A.)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Singapore ; Hackensack, NJ : World Scientific, ©2008.
Temas:
Acceso en línea:Texto completo

MARC

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049 |a UAMI 
245 0 0 |a Nanofabrication :  |b fundamentals and applications /  |c editor, Ampere A. Tseng. 
260 |a Singapore ;  |a Hackensack, NJ :  |b World Scientific,  |c ©2008. 
300 |a 1 online resource (viii, 574 pages) :  |b illustrations (some color) 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
504 |a Includes bibliographical references and index. 
505 0 |a Ch. 1. Atom, molecule, and nanocluster manipulations for nanostructure fabrication using scanning probe microscopy / A.A. Tseng [and others] -- ch. 2. Atomic force microscope lithography / N. Kawasegi [and others] -- ch. 3. Scanning probe arrays for nanoscale imaging, sensing, and modification / C. Santschi [and others] -- ch. 4. Using biomolecules for self-assembly of engineered nano-scale structures and devices / R. Mehta, J. Lund, and B.A. Parviz -- ch. 5. Nanofabrication based on self-assembled alumina templates / S. Sen and N.A. Kouklin -- ch. 6. Nanowire assembly and integration / Z. Gu and D.H. Gracias -- ch. 7. Taper-drawing fabrication of glass nanowires / L. Tong and E. Mazur -- ch. 8. Extreme ultraviolet lithography / H. Kinoshita -- ch. 9. Electron projection lithography / T. Miura [and others] -- ch. 10. Electron beam direct writing / K. Yamazaki -- ch. 11. Electron beam induced deposition / K. Mitsuishi -- ch. 12. High-resolution electron-beam-induced deposition / P.A. Crozier and C.W. Hagen -- ch. 13. Focused ion beams and interaction with solids / T. Ishitani, T. Ohnishi, and T. Yaguchi -- ch. 14. Nano/microstructuring of ceramic surfaces by unconventional lithographic methods / R.C. Salvarezza and O. Azzaroni -- ch. 15. Alternative nanofabrication approaches for non-CMOS applications / C.V. Cojocaru, F. Cicoira, and F. Rosei -- ch. 16. Nanofabrication of nanoelectromechanical systems (NEMS): emerging techniques / K.L. Ekinci and J. Brugger. 
520 |a Many of the devices and systems used in modern industry are becoming progressively smaller and have reached the nanoscale domain. Nanofabrication aims at building nanoscale structures, which can act as components, devices, or systems, in large quantities at potentially low cost. Nanofabrication is vital to all nanotechnology fields, especially for the realization of nanotechnology that involves the traditional areas across engineering and science. This is the first book solely dedicated to the manufacturing technology in nanoscale structures, devices, and systems and is designed to satisfy the growing demands of researchers, professionals, and graduate students. Both conventional and non-conventional fabrication technologies are introduced with emphasis on multidisciplinary principles, methodologies, and practical applications. While conventional technologies consider the emerging techniques developed for next generation lithography, non-conventional techniques include scanning probe microscopy lithography, self-assembly, and imprint lithography, as well as techniques specifically developed for making carbon tubes and molecular circuits and devices. 
546 |a English. 
590 |a Knovel  |b ACADEMIC - Nanotechnology 
590 |a eBooks on EBSCOhost  |b EBSCO eBook Subscription Academic Collection - Worldwide 
650 0 |a Nanostructured materials. 
650 0 |a Nanostructures. 
650 0 |a Scanning probe microscopy. 
650 0 |a Lithography, Electron beam. 
650 2 |a Nanostructures 
650 2 |a Microscopy, Scanning Probe 
650 6 |a Nanomatériaux. 
650 6 |a Nanostructures. 
650 6 |a Microscopie à sonde à balayage. 
650 6 |a Lithographie par faisceau d'électrons. 
650 7 |a TECHNOLOGY & ENGINEERING  |x Nanotechnology & MEMS.  |2 bisacsh 
650 7 |a Lithography, Electron beam  |2 fast 
650 7 |a Nanostructured materials  |2 fast 
650 7 |a Nanostructures  |2 fast 
650 7 |a Scanning probe microscopy  |2 fast 
650 7 |a Materials Science.  |2 hilcc 
650 7 |a Atomic Physics.  |2 hilcc 
650 7 |a Physics.  |2 hilcc 
650 7 |a Chemical & Materials Engineering.  |2 hilcc 
650 7 |a Engineering & Applied Sciences.  |2 hilcc 
650 7 |a Physical Sciences & Mathematics.  |2 hilcc 
700 1 |a Tseng, A. A.  |q (Ampere A.) 
776 0 8 |i Print version:  |t Nanofabrication.  |d Singapore ; Hackensack, NJ : World Scientific, 2008  |z 9789812700766  |z 9812700765  |w (DLC) 2008275080  |w (OCoLC)173721197 
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