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Chemical vapour deposition : precursors, processes and applications /
Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD)...
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | , |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Cambridge, UK :
Royal Society of Chemistry,
©2009.
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| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 245 | 0 | 0 | |a Chemical vapour deposition : |b precursors, processes and applications / |c edited by Anthony C. Jones, Michael L. Hitchman. |
| 246 | 3 | |a Chemical vapor deposition | |
| 260 | |a Cambridge, UK : |b Royal Society of Chemistry, |c ©2009. | ||
| 300 | |a 1 online resource (xv, 582 pages) : |b illustrations, plans | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 504 | |a Includes bibliographical references and index. | ||
| 588 | 0 | |a Print version record. | |
| 505 | 0 | |a 9780854044658; i_iv; v_vi; vii_xvi; 001_036; 037_092; 093_157; 158_206; 207_271; 272_319; 320_356; 357_412; 413_450; 451_476; 477_493; 494_534; 535_570; 571_582 | |
| 520 | |a Chemical Vapour Deposition (CVD) involves the deposition of thin solid films from chemical precursors in the vapour phase, and encompasses a variety of deposition techniques, including a range of thermal processes, plasma enhanced CVD (PECVD), photon- initiated CVD, and atomic layer deposition (ALD). The development of CVD technology owes a great deal to collaboration between different scientific disciplines such as chemistry, physics, materials science, engineering and microelectronics, and the publication of this book will promote and stimulate continued dialogue between scientists from thes. | ||
| 506 | |a University staff and students only. Requires University Computer Account login off-campus. | ||
| 590 | |a Knovel |b ACADEMIC - Electronics & Semiconductors | ||
| 590 | |a Knovel |b ACADEMIC - Adhesives Coatings Sealants And Inks | ||
| 650 | 0 | |a Chemical vapor deposition. | |
| 650 | 6 | |a Dépôt chimique en phase vapeur. | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Technical & Manufacturing Industries & Trades. |2 bisacsh | |
| 650 | 7 | |a Chemical vapor deposition. |2 fast |0 (OCoLC)fst00853229 | |
| 700 | 1 | |a Jones, Anthony C. | |
| 700 | 1 | |a Hitchman, Michael L. | |
| 776 | 0 | 8 | |i Print version: |t Chemical vapour deposition. |d Cambridge, UK : Royal Society of Chemistry, ©2009 |z 9780854044658 |w (DLC) 2009419379 |w (OCoLC)244653597 |
| 856 | 4 | 0 | |u https://appknovel.uam.elogim.com/kn/resources/kpCVDPPA04/toc |z Texto completo |
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