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Frozen ground engineering /
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Hoboken, N.J. : [Place of publication not identified] :
Wiley ; American Society of Civil Engineers,
©2004.
|
| Edición: | 2nd ed. |
| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Glow discharge plasmas and sources for etching and deposition / Stephen M. Rossnagel
- Evaporation processes / Chandra Deshpandey and Rointan Bunshah
- Molecular beam epitaxy / Peter P. Chow
- Sputter deposition processes / Robert Parsons
- The cathodic arc plasma deposition of thin films / Philip C. Johnson
- Thermal chemical vapor deposition / Klavs F. Jensen and Werner Kern
- OMVPE of compound semiconductors / Thomas F. Kuech and Klavs F. Jensen
- Photochemical vapor deposition / J. Gary Eden
- Sol-gel coatings / Lisa C. Klein
- Plasma-enhanced chemical vapor deposition / Rafael Reif and Werner Kern
- Formation of inorganic films by remote plasma-enhanced chemical-vapor deposition / G. Lucovsky [and others]
- Selected area processing / Thomas M. Mayer and Susan D. Allen
- Plasma-assisted etching / Hans W. Lehmann.
- Ion beam etching / P. Reese Puckett, Stephen L. Michel, and William E. Hughes
- Laser-driven etching / Carol I.H. Ashby.