Thin film processes II /

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This sequel to the 1978 classic, Thin Film Processes, gives a clear, practical exposition of important thin film deposition and etching processes that have not yet been adequately reviewed. It discusses selected processes in tutorial overviews with implementation guide lines and an introduction to t...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Vossen, John L., Kern, Werner, 1925-
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Boston : Academic Press, ©1991.
Colección:Thin film processes ; 2
Temas:
Thin films.
Couches minces.
TECHNOLOGY & ENGINEERING > Electronics > Semiconductors.
TECHNOLOGY & ENGINEERING > Electronics > Solid State.
Thin films
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Glow discharge plasmas and sources for etching and deposition / Stephen M. Rossnagel
  • Evaporation processes / Chandra Deshpandey and Rointan Bunshah
  • Molecular beam epitaxy / Peter P. Chow
  • Sputter deposition processes / Robert Parsons
  • The cathodic arc plasma deposition of thin films / Philip C. Johnson
  • Thermal chemical vapor deposition / Klavs F. Jensen and Werner Kern
  • OMVPE of compound semiconductors / Thomas F. Kuech and Klavs F. Jensen
  • Photochemical vapor deposition / J. Gary Eden
  • Sol-gel coatings / Lisa C. Klein
  • Plasma-enhanced chemical vapor deposition / Rafael Reif and Werner Kern
  • Formation of inorganic films by remote plasma-enhanced chemical-vapor deposition / G. Lucovsky [and others]
  • Selected area processing / Thomas M. Mayer and Susan D. Allen
  • Plasma-assisted etching / Hans W. Lehmann.
  • Ion beam etching / P. Reese Puckett, Stephen L. Michel, and William E. Hughes
  • Laser-driven etching / Carol I.H. Ashby.

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