Handbook of ion beam processing technology : principles, deposition, film modification, and synthesis /
Clasificación: | Libro Electrónico |
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Otros Autores: | , , |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
Westwood, N.J. :
Noyes Publications,
©1989.
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Edición: | Reprint ed. |
Temas: | |
Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Perspective on past, present and future uses of ion beam technology / Jerome J. Cuomo, Stephen M. Rossnagel and Harold R. Kaufman
- Gridded broad-beam ion sources / Harold R. Kaufman and Raymond S. Robinson
- Electron cyclotron resonance (ECR) ion sources / William M. Holber
- Hall effect ion sources / Raymond S. Robinson and Harold R. Kaufman
- Ionized cluster bean (ICB) deposition and epitaxy / Isao Yamada and Toshinori Takagi
- Quantitative sputtering / Peer C. Zalm
- Laser- induced fluorescence as a tool for the study of ion beam sputtering / Wallis F. Calaway [and others]
- Characterization of atoms desorbed from surfaces by ion bombardment using multiphoton ionization detection / David L. Pappas, Nicholas Winograd and Fred M. Kimock.
- The application of positionization for sputtering studies and surface or thin film analysis / Hans Oechsner
- The modification of films by ion bombardment / Eric Kay and Stephen M. Rossnagel
- Control of film properties by ion-assisted deposition using broad beam sources / Ronnen A. Roy and Dennis S. Yee
- Etching with directed beams / Michael Geis [and others]
- Film growth modification by concurrent ion bombardment : theory and simulation / Karl-Heinz Muller
- Interface structure and thin film adhesion / John Baglin
- Modification of thin films by off-normal incidence ion bombardment / R. Mark Bradley
- Ion beam interactions with polymer surfaces / Robert C. White and Paul S. Ho.
- Topography : texturing effects / Bruce A. Banks
- Methods and techniques of ion beam processes / Stephen M. Rossnagel
- Ion-assisted dielectric and optical coatings / Phil J. Martin and Roger P. Netterfield
- Diamond and diamond-like thin films by ion beam techniques / Makoto Kitabatake and Kiyotaka Wasa.