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060815s1989 njua ob 001 0 eng d |
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|a KNOVL
|b eng
|e pn
|c KNOVL
|d OCLCQ
|d DEBSZ
|d OCLCQ
|d KNOVL
|d ZCU
|d OCLCF
|d KNOVL
|d OCLCQ
|d RIC
|d OCLCQ
|d UAB
|d OCLCQ
|d CEF
|d RRP
|d YOU
|d S2H
|d OCLCO
|d OCLCQ
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| 020 |
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|a 1591249791
|q (electronic bk.)
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|a 9781591249795
|q (electronic bk.)
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|a AU@
|b 000040701770
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|a DEBSZ
|b 338255788
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|a NZ1
|b 10988149
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|a GBVCP
|b 856587443
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|a (OCoLC)70894827
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|b Knovel Corporation
|n http://www.knovel.com
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|a QC702.7.I55
|b H36 1989eb
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| 082 |
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|a 621.3815/2
|2 22
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| 049 |
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|a UAMI
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| 245 |
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|a Handbook of ion beam processing technology :
|b principles, deposition, film modification, and synthesis /
|c edited by Jerome J. Cuomo and Stephen M. Rossnagel, Harold R. Kaufman.
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| 250 |
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|a Reprint ed.
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| 260 |
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|a Westwood, N.J. :
|b Noyes Publications,
|c ©1989.
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| 300 |
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|a 1 online resource (xviii, 438 pages) :
|b illustrations
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| 336 |
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|a text
|b txt
|2 rdacontent
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| 337 |
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|a computer
|b c
|2 rdamedia
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| 338 |
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|a online resource
|b cr
|2 rdacarrier
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| 504 |
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|a Includes bibliographical references and index.
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| 505 |
0 |
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|a Perspective on past, present and future uses of ion beam technology / Jerome J. Cuomo, Stephen M. Rossnagel and Harold R. Kaufman -- Gridded broad-beam ion sources / Harold R. Kaufman and Raymond S. Robinson -- Electron cyclotron resonance (ECR) ion sources / William M. Holber -- Hall effect ion sources / Raymond S. Robinson and Harold R. Kaufman -- Ionized cluster bean (ICB) deposition and epitaxy / Isao Yamada and Toshinori Takagi -- Quantitative sputtering / Peer C. Zalm -- Laser- induced fluorescence as a tool for the study of ion beam sputtering / Wallis F. Calaway [and others] -- Characterization of atoms desorbed from surfaces by ion bombardment using multiphoton ionization detection / David L. Pappas, Nicholas Winograd and Fred M. Kimock.
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| 505 |
0 |
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|a The application of positionization for sputtering studies and surface or thin film analysis / Hans Oechsner -- The modification of films by ion bombardment / Eric Kay and Stephen M. Rossnagel -- Control of film properties by ion-assisted deposition using broad beam sources / Ronnen A. Roy and Dennis S. Yee -- Etching with directed beams / Michael Geis [and others] -- Film growth modification by concurrent ion bombardment : theory and simulation / Karl-Heinz Muller -- Interface structure and thin film adhesion / John Baglin -- Modification of thin films by off-normal incidence ion bombardment / R. Mark Bradley -- Ion beam interactions with polymer surfaces / Robert C. White and Paul S. Ho.
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| 505 |
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|a Topography : texturing effects / Bruce A. Banks -- Methods and techniques of ion beam processes / Stephen M. Rossnagel -- Ion-assisted dielectric and optical coatings / Phil J. Martin and Roger P. Netterfield -- Diamond and diamond-like thin films by ion beam techniques / Makoto Kitabatake and Kiyotaka Wasa.
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| 588 |
0 |
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|a Print version record.
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| 590 |
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|a Knovel
|b ACADEMIC - Electronics & Semiconductors
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| 650 |
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|a Ion implantation.
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| 650 |
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|a Ion bombardment
|x Industrial applications.
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| 650 |
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6 |
|a Ions
|x Implantation.
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| 650 |
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6 |
|a Bombardement ionique
|x Applications industrielles.
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| 650 |
|
7 |
|a Ion bombardment
|x Industrial applications.
|2 fast
|0 (OCoLC)fst00978570
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| 650 |
|
7 |
|a Ion implantation.
|2 fast
|0 (OCoLC)fst00978590
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| 700 |
1 |
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|a Cuomo, J. J.
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| 700 |
1 |
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|a Rossnagel, Stephen M.
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| 700 |
1 |
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|a Kaufman, Harold R.
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| 776 |
0 |
8 |
|i Print version:
|t Handbook of ion beam processing technology.
|b Reprint ed.
|d Westwood, N.J. : Noyes Publications, ©1989
|z 081551199X
|w (DLC) 88038244
|w (OCoLC)18907337
|
| 856 |
4 |
0 |
|u https://appknovel.uam.elogim.com/kn/resources/kpHIBPTPD3/toc
|z Texto completo
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| 994 |
|
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|a 92
|b IZTAP
|
