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00000cam a2200000 a 4500 |
| 001 |
KNOVEL_ocm62205108 |
| 003 |
OCoLC |
| 005 |
20231027140348.0 |
| 006 |
m o d |
| 007 |
cr cn||||||||| |
| 008 |
051102s1999 enka ob 001 0 eng d |
| 040 |
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|a KNOVL
|b eng
|e pn
|c KNOVL
|d MYG
|d OCLCQ
|d KNOVL
|d ZCU
|d OCLCF
|d KNOVL
|d OCLCO
|d KNOVL
|d OCLCQ
|d OCLCE
|d UWW
|d OCLCQ
|d RRP
|d AU@
|d S2H
|d OCLCO
|d OCLCQ
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| 019 |
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|a 300638758
|a 607381047
|a 639758977
|a 977040783
|a 1058059932
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| 020 |
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|a 159124871X
|q (electronic bk.)
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| 020 |
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|a 9781591248712
|q (electronic bk.)
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| 020 |
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|a 0852969333
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| 020 |
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|a 9780852969335
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| 029 |
1 |
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|a AU@
|b 000040124852
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| 029 |
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|a GBVCP
|b 856584886
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|a NZ1
|b 10564298
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| 029 |
1 |
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|a NZ1
|b 14231581
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| 035 |
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|a (OCoLC)62205108
|z (OCoLC)300638758
|z (OCoLC)607381047
|z (OCoLC)639758977
|z (OCoLC)977040783
|z (OCoLC)1058059932
|
| 037 |
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|b Knovel Corporation
|n http://www.knovel.com
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| 042 |
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|a dlr
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| 050 |
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4 |
|a QD181.S6
|b P76 1999eb
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| 082 |
0 |
4 |
|a 546/.683
|2 22
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| 049 |
|
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|a UAMI
|
| 245 |
0 |
0 |
|a Properties of crystalline silicon /
|c edited by Robert Hull.
|
| 260 |
|
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|a London :
|b INSPEC, the Institution of Electrical Engineers,
|c ©1999.
|
| 300 |
|
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|a 1 online resource (xxvi, 1016 pages) :
|b illustrations
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| 336 |
|
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|a text
|b txt
|2 rdacontent
|
| 337 |
|
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|a computer
|b c
|2 rdamedia
|
| 338 |
|
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|a online resource
|b cr
|2 rdacarrier
|
| 490 |
1 |
|
|a EMIS datareviews series ;
|v no. 20
|
| 504 |
|
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|a Includes bibliographical references and index.
|
| 505 |
2 |
0 |
|t Melt growth /
|r edited by T. Abe --
|t Epitacxial growth /
|r edited by J.C. Bean --
|t Structural and mechanical properties /
|r edited by A. George --
|t Thermal properties /
|r edited by M.R. Brozel --
|t Surface properties and cleaning /
|r edited by R.J. Nemanich --
|t Structural modelling /
|r edited by M. Heggie --
|t Band structure /
|r edited by R.J. Turton --
|t Electrical properties /
|r edited by S.H. Jones --
|t Impurities in silicon /
|r edited by S.J. Pearson --
|t Dopants in silicon /
|r edited by K. Jones --
|t Defect levels in silicon /
|r edited by H. Godfrey --
|t Optical properties /
|r edited by D.E. Aspnes --
|t Photoconductivity and photogenerated carriers /
|r edited by M. Willander --
|t Implantation/irradiation of silicon /
|r edited by R. Elliman --
|t Gettering /
|r edited by E.R. Weber --
|t Etching /
|r edited by K.R. Williams --
|t Metal-silicon contacts /
|r edited by L. Schowalter --
|t Silicon on insulator technology /
|r edited by S.S. Iyer.
|
| 588 |
0 |
|
|a Print version record.
|
| 506 |
|
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|3 Use copy
|f Restrictions unspecified
|2 star
|5 MiAaHDL
|
| 533 |
|
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|a Electronic reproduction.
|b [Place of publication not identified] :
|c HathiTrust Digital Library,
|d 2010.
|5 MiAaHDL
|
| 538 |
|
|
|a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
|u http://purl.oclc.org/DLF/benchrepro0212
|5 MiAaHDL
|
| 583 |
1 |
|
|a digitized
|c 2010
|h HathiTrust Digital Library
|l committed to preserve
|2 pda
|5 MiAaHDL
|
| 590 |
|
|
|a Knovel
|b ACADEMIC - Electronics & Semiconductors
|
| 590 |
|
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|a Knovel
|b ACADEMIC - Ceramics & Ceramic Engineering
|
| 650 |
|
0 |
|a Silicon.
|
| 650 |
|
6 |
|a Silicium.
|
| 650 |
|
7 |
|a silicon.
|2 aat
|
| 650 |
|
7 |
|a Silicon.
|2 fast
|0 (OCoLC)fst01118631
|
| 700 |
1 |
|
|a Hull, Robert,
|d 1959-
|
| 710 |
2 |
|
|a INSPEC (Information service)
|
| 776 |
0 |
8 |
|i Print version:
|t Properties of crystalline silicon.
|d London : INSPEC, the Institution of Electrical Engineers, ©1999
|z 0852969333
|w (OCoLC)41984192
|
| 830 |
|
0 |
|a EMIS datareviews series ;
|v no. 20.
|
| 856 |
4 |
0 |
|u https://appknovel.uam.elogim.com/kn/resources/kpPCS00005/toc
|z Texto completo
|
| 994 |
|
|
|a 92
|b IZTAP
|
