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Ionized-cluster beam deposition and epitaxy /
The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor principal: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Park Ridge, N.J., U.S.A. :
Noyes Publications,
©1988.
|
| Colección: | Materials science and process technology series.
|
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
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| 100 | 1 | |a Takagi, Toshinori. | |
| 245 | 1 | 0 | |a Ionized-cluster beam deposition and epitaxy / |c by Toshinori Takagi. |
| 260 | |a Park Ridge, N.J., U.S.A. : |b Noyes Publications, |c ©1988. | ||
| 300 | |a 1 online resource (viii, 231 pages) : |b illustrations | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Materials science and process technology series | |
| 520 | |a The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin. | ||
| 504 | |a Includes bibliographical references and index. | ||
| 588 | 0 | |a Print version record. | |
| 506 | |3 Use copy |f Restrictions unspecified |2 star |5 MiAaHDL | ||
| 533 | |a Electronic reproduction. |b [Place of publication not identified] : |c HathiTrust Digital Library, |d 2010. |5 MiAaHDL | ||
| 538 | |a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002. |u http://purl.oclc.org/DLF/benchrepro0212 |5 MiAaHDL | ||
| 583 | 1 | |a digitized |c 2010 |h HathiTrust Digital Library |l committed to preserve |2 pda |5 MiAaHDL | |
| 590 | |a Knovel |b ACADEMIC - Electronics & Semiconductors | ||
| 650 | 0 | |a Epitaxy. | |
| 650 | 0 | |a Thin film devices |x Design and construction. | |
| 650 | 6 | |a Épitaxie. | |
| 650 | 7 | |a Epitaxy |2 fast | |
| 650 | 7 | |a Thin film devices |x Design and construction |2 fast | |
| 650 | 7 | |a Couches minces. |2 ram | |
| 650 | 7 | |a Epitaxie. |2 ram | |
| 776 | 0 | 8 | |i Print version: |a Takagi, Toshinori. |t Ionized-cluster beam deposition and epitaxy. |d Park Ridge, N.J., U.S.A. : Noyes Publications, ©1988 |z 081551168X |w (DLC) 88017884 |w (OCoLC)18050859 |
| 830 | 0 | |a Materials science and process technology series. | |
| 856 | 4 | 0 | |u https://appknovel.uam.elogim.com/kn/resources/kpICBDE005/toc |z Texto completo |
| 936 | |a BATCHLOAD | ||
| 994 | |a 92 |b IZTAP | ||