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Ionized-cluster beam deposition and epitaxy /

The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Takagi, Toshinori
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Park Ridge, N.J., U.S.A. : Noyes Publications, ©1988.
Colección:Materials science and process technology series.
Temas:
Acceso en línea:Texto completo
Descripción
Sumario:The technique of ionized-cluster beam (ICB) deposition, the fundamentals of ICB technology, and technical applications of thin films produced by ICB deposition are presented for those interested or working in the field. ICB processes are characterized, and equipment is available. The films deposited are often superior to those deposited by either evaporation or sputtering, and the range of control of the process exceeds other techniques by a great margin.
Descripción Física:1 online resource (viii, 231 pages) : illustrations
Bibliografía:Includes bibliographical references and index.
ISBN:1591241073
9781591241072
9780815511687
081551168X