Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /
An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
Clasificación: | Libro Electrónico |
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Otros Autores: | Rossnagel, Stephen M., Cuomo, J. J., Westwood, William D. (William Dickson), 1937- |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
Park Ridge, N.J. :
Noyes Publications,
©1990.
|
Colección: | Materials science and process technology series.
|
Temas: | |
Acceso en línea: | Texto completo |
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