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Handbook of plasma processing technology : fundamentals, etching, deposition, and surface interactions /

An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.

Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Rossnagel, Stephen M., Cuomo, J. J., Westwood, William D. (William Dickson), 1937-
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Park Ridge, N.J. : Noyes Publications, ©1990.
Colección:Materials science and process technology series.
Temas:
Acceso en línea:Texto completo
Descripción
Sumario:An overview of the technology that describes the advantages provided by plasmas, plasma fundamentals, and a range of plasma processes relevant to the deposition and etching of thin films for microelectronics and other fields.
Descripción Física:1 online resource (xxiii, 523 pages) : illustrations
Bibliografía:Includes bibliographical references and index.
ISBN:1591242975
9781591242970
9780815512202
0815512201