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|a Handbook of vacuum arc science and technology :
|b fundamentals and applications /
|c edited by Raymond L. Boxman, David M. Sanders, Philip J. Martin ; foreword by James M. Lafferty.
|
260 |
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|a Park Ridge, N.J., U.S.A. :
|b Noyes Publications,
|c ©1995.
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300 |
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|a 1 online resource (xxxi, 742 pages) :
|b illustrations
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|a text
|b txt
|2 rdacontent
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|a online resource
|b cr
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490 |
1 |
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|a Materials science and process technology series. Electronic materials and process technology
|
520 |
|
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|a Describes the basic physics and technological applications of vacuum arcs. Part I describes basic physics of the vacuum arc, beginning with a brief tutorial review of plasma and electrical discharge physics, then describes the arc ignition process, cathode and anode spots which serve as the locus for plasma generation, and resultant interelectrode plasma. Part II describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of intense electron, ion, plasma, and x-ray beams.
|
504 |
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|a Includes bibliographical references and index.
|
588 |
0 |
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|a Print version record.
|
505 |
0 |
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|a Part I: Fundamentals of Vacuum Arc Science and Technology -- Electrical Discharges and Plasmas-A Brief Tutorial -- Arc Ignition -- Cathode Spots -- The Interelectrode Plasma -- Anode Phenomena -- Part II: Applications of Vacuum Arc Science and Technology -- Coatings From the Vacuum Arc -- Vacuum Arc Metal Processing -- Vacuum Switching of High Current and High Voltage at Power Frequencies -- Pulsed Power Applications -- Index -- About the Contributors.
|
506 |
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|3 Use copy
|f Restrictions unspecified
|2 star
|5 MiAaHDL
|
533 |
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|a Electronic reproduction.
|b [Place of publication not identified] :
|c HathiTrust Digital Library,
|d 2010.
|5 MiAaHDL
|
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|a Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
|u http://purl.oclc.org/DLF/benchrepro0212
|5 MiAaHDL
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|a digitized
|c 2010
|h HathiTrust Digital Library
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|a Knovel
|b ACADEMIC - Electronics & Semiconductors
|
650 |
|
0 |
|a Vacuum arcs.
|
650 |
|
0 |
|a Vacuum arcs
|x Industrial applications.
|
650 |
|
0 |
|a Plasma (Ionized gases)
|
650 |
|
6 |
|a Arcs sous vide.
|
650 |
|
6 |
|a Arcs sous vide
|x Applications industrielles.
|
650 |
|
6 |
|a Plasma (Gaz ionisés)
|
650 |
|
7 |
|a SCIENCE
|x Physics
|x Electromagnetism.
|2 bisacsh
|
650 |
|
7 |
|a SCIENCE
|x Physics
|x Electricity.
|2 bisacsh
|
650 |
|
7 |
|a Plasma (Ionized gases)
|2 fast
|
650 |
|
7 |
|a Vacuum arcs
|2 fast
|
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|
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|a Vacuum arcs
|x Industrial applications
|2 fast
|
650 |
|
7 |
|a Vakuumlichtbogen
|2 gnd
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650 |
|
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|a Plasmas (gaz ionisés)
|2 ram
|
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|
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|a Arc électrique.
|2 ram
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1 |
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|a Sanders, David M.
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700 |
1 |
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|a Boxman, R. L.
|
700 |
1 |
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|a Martin, Philip J.
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776 |
0 |
8 |
|i Print version:
|t Handbook of vacuum arc science and technology.
|d Park Ridge, N.J., U.S.A. : Noyes Publications, ©1995
|z 0815513755
|w (DLC) 95022677
|w (OCoLC)32665287
|
830 |
|
0 |
|a Materials science and process technology series.
|p Electronic materials and process technology.
|
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|u https://appknovel.uam.elogim.com/kn/resources/kpHVASTFA2/toc
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