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Promoting a second-tier protection regime for innovation of small and medium-sized enterprises in South Asia : the case of Sri Lanka /

Intellectual Property law is a dynamic field; its ever-changing landscape challenges us to constantly revisit the existing laws and policies. Although ideological currents of a second-tier patent (STP) regime are sweeping through the South Asian region in recent years, the concept of utility model o...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Punchi Hewage, Nishantha Sampath (Autor)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Baden-Baden : Augsburg : Nomos ; MIPLC, Munich Intellectual Property Law Center, 2015.
Edición:1. edition.
Colección:MIPLC studies ; v. 26.
Temas:
Acceso en línea:Texto completo

MARC

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245 1 0 |a Promoting a second-tier protection regime for innovation of small and medium-sized enterprises in South Asia :  |b the case of Sri Lanka /  |c Nishantha Sampath Punchi Hewage. 
250 |a 1. edition. 
264 1 |a Baden-Baden :  |b Nomos ;  |a Augsburg :  |b MIPLC, Munich Intellectual Property Law Center,  |c 2015. 
264 4 |c ©2015 
300 |a 1 online resource 
336 |a text  |b txt  |2 rdacontent 
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490 1 |a MIPLC studies ;  |v volume 26 
504 |a Includes bibliographical references. 
505 8 |a 1.2. Preliminary Thoughts and Definitions 1.3. Sri Lankan Innovation Landscape; 1.4. TK-based Innovation; 1.5. The South Asian Scenario; 1.6. Overview of Second-Tier Protection; 1.7. International Legal Framework; 1.8. Conclusion; 2.1. Introduction; 2.2. Patent Protection in Sri Lanka; 2.3. Design Protection in Sri Lanka; 2.4. Comparative view of Different IPRs in Sri Lanka; 2.5. Conclusion; 3.1. Unfair Competition Law; 3.2. Trade Secrets Protection; 4.1. Experience from Developed Countries; 4.2. Experience from Emerging and Developing Economies; 5.1. Indian Perspectives 
505 8 |a 5.2. Pakistani Perspectives 5.3. Whether and to what extent are these Experiences applicable to Sri Lanka?; 6.1. Arguments for introducing an STP in Sri Lanka; 6.2. Arguments against such an STP Regime; 6.3. Design and Structure; 6.4. Core Elements; 6.5. Prosecution and Enforcement; 6.6. Interface with other IPR Systems; 6.7. Guarding against Abuse; 6.8. Domestic IP Infrastructure (IP Office, Courts, Professionals); 6.9. TK-based Innovation and Second-Tier Protection; 6.10. Conclusion; 7.1. Policy Options; 7.2. General Recommendations and Observations; 7.3. Conclusion 
520 |a Intellectual Property law is a dynamic field; its ever-changing landscape challenges us to constantly revisit the existing laws and policies. Although ideological currents of a second-tier patent (STP) regime are sweeping through the South Asian region in recent years, the concept of utility model or petty patent remains a largely unexplored option in Sri Lanka and in other parts of the South Asian region. Against this backdrop, this book offers an alternative approach to incentivise minor and incremental innovations of SMEs. It also explores whether Sri Lanka and other developing economies in the South Asian region can benefit from such an STP regime if it is tailored to the specific characteristics of the innovation landscape of the country. Nishantha Sampath Punchi Hewage, LL. B. (Hons.), LLM in IP (MIPLC), is a Lecturer in the Faculty of Law, University of Colombo, Sri Lanka. He is also an Attorney-at-Law of the Supreme Court of Sri Lanka. He conducts research in the field of intellectual property (IP), innovation, competition, and human rights. 
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650 0 |a Industrial property  |z South Asia. 
650 6 |a Propriété industrielle  |z Sri Lanka. 
650 6 |a Propriété industrielle  |z Asie méridionale. 
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650 7 |a Industrial property  |2 fast 
650 7 |a Patent laws and legislation  |2 fast 
651 7 |a South Asia  |2 fast 
651 7 |a Sri Lanka  |2 fast 
776 0 8 |i Print version:  |w (GyWOH)har155014073 
776 0 8 |i Print version:  |a Punchi Hewage, Nishantha Sampath.  |t Promoting a second-tier protection regime for innovation of small and medium-sized enterprises in South Asia.  |b 1. edition.  |d Baden-Baden : Nomos ; Augsburg : MIPLC, Munich Intellectual Property Law Center, 2015  |z 9783848718856  |z 3848718855  |w (OCoLC)914164070 
830 0 |a MIPLC studies ;  |v v. 26. 
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