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Introduction to focused ion beam nanometrology /

This book describes modern focused ion beam microscopes and techniques and how they can be used to aid materials metrology and as tools for the fabrication of devices that in turn are used in many other aspects of fundamental metrology. Beginning with a description of the currently available instrum...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Cox, David C. (David Christopher), 1965- (Autor)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: San Rafael [California] (40 Oak Drive, San Rafael, CA, 94903, USA) : Morgan & Claypool Publishers, [2015]
Colección:IOP concise physics.
IOP (Series). Release 2.
Temas:
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Preface
  • Acknowledgements
  • Author biography
  • 1. Metrology
  • 1.1. What is metrology?
  • 1.2. Metrology in the FIB
  • 2. Focused ion beam
  • 2.1. Introduction to the FIB instrument
  • 2.2. Types of instrument
  • 2.3. Gas injection systems
  • 2.4. Patterning options
  • 2.5. Other equipment and techniques found on FIB instruments
  • 3. Ion-solid interactions
  • 3.1. Overview
  • 3.2. Imaging-secondary electrons and secondary ions
  • 3.3. Ion milling-ion range, sputter yield and damage
  • 3.4. Software to approximate ion range, damage and sputter yield
  • 4. Focused ion beam-materials science applications
  • 4.1. Overview
  • 4.2. TEM foils and cross-sectioning
  • 4.3. Three-dimensional reconstruction
  • 4.4. Mechanical testing
  • 4.5. Residual stress measurement and deformation
  • 4.6. Secondary ion mass spectrometry and atom probe
  • 5. Focused ion beam fabrication for metrology
  • 5.1. Overview
  • 5.2. Superconducting devices
  • 5.3. Utilising manipulation systems
  • 5.4. AFM cantilevers and dimensional artefacts for scanning probe techniques
  • 5.5. Other devices
  • 6. Future developments
  • 6.1. Where we currently are
  • 6.2. The end of the Ga ion source?
  • 6.3. Final thoughts.