Chemical vapour deposition : growth processes on an atomic level /

Chemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Larsson, Karin, 1955- (Autor)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Bristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) : IOP Publishing, [2022]
Colección:IOP (Series). Release 22.
IOP ebooks. 2022 collection.
Temas:
Chemical vapor deposition.
Surface chemistry & adsorption.
TECHNOLOGY & ENGINEERING / Materials Science / Thin Films, Surfaces & Interfaces.
Acceso en línea:Texto completo

MARC

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100 1 |a Larsson, Karin,  |d 1955-  |e author. 
245 1 0 |a Chemical vapour deposition :  |b growth processes on an atomic level /  |c Karin Larsson. 
264 1 |a Bristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) :  |b IOP Publishing,  |c [2022] 
300 |a 1 online resource (various pagings) :  |b illustrations (some color). 
336 |a text  |2 rdacontent 
337 |a electronic  |2 isbdmedia 
338 |a online resource  |2 rdacarrier 
490 1 |a [IOP release $release] 
490 1 |a IOP ebooks. [2022 collection] 
500 |a "Version: 20221201"--Title page verso. 
504 |a Includes bibliographical references. 
505 0 |a 1. Introduction -- 1.1. Chemical vapour phase deposition -- 1.2. Overview of thin film characterization techniques -- 1.3. Theoretical modelling and simulations 
505 8 |a 2. Common CVD reactor setups -- 2.1. General -- 2.2. Classification of CVD reactors 
505 8 |a 3. CVD processes on an atomic level -- 3.1. Introduction -- 3.2. Chemical reactions in the substrate/thin film interface -- 3.3. Chemical reactions in the thin film/gas interface 
505 8 |a 4. Theoretical methods and methodologies -- 4.1. General -- 4.2. The Schrödinger equation -- 4.3. The density functional theory method -- 4.4. Geometry optimizations -- 4.5. Transition state search -- 4.6. Process energies -- 4.7. Property analysis methods 
505 8 |a 5. Construction of solid surface models -- 5.1. Surfaces within materials science of today -- 5.2. Surface reactivities -- 5.3. Surface planes -- 5.4. Surface morphologies -- 5.5. Surface relaxation -- 5.6. Surface reconstruction -- 5.7. Construction of model surfaces for CVD simulations 
505 8 |a 6. Thermodynamic modelling of CVD growth processes -- 6.1. General -- 6.2. Stability of non-terminated surfaces -- 6.3. Surface termination -- 6.4. Creation of surface reactive sites -- 6.5. Adsorption of growth species -- 6.6. Identification of the rate-limiting step in the CVD growth of diamond -- 6.7. Influence of dopants on the growth process 
505 8 |a 7. Identification of growth mechanisms for ALD deposition of Cu -- 7.1. General -- 7.2. Test-calculations -- 7.3. Adsorption of Cu-containing growth species -- 7.4. Disproportionation of the copper(I)chloride molecule -- 7.5. Removal of Cl from the CuCl adsorbate -- 7.6. Reaction barriers 
505 8 |a 8. Prerequisites for vapour phase growth of phase pure cubic BN -- 8.1. Energetical vapour phase deposition -- 8.2. Gentle chemical vapour phase deposition -- 8.3. Termination of the c-BN surface -- 8.4. Adsorption of growth species on the c-BN surface -- 8.5. Surface migration during growth of c-BN 
505 8 |a 9. Effect of substrates on the vapour phase growth of thin film materials -- 9.1. Substrate effect on the vapour phase growth of c-BN -- 9.2. Combined effect of substrate and terminating species on the vapour phase growth of c-BN -- 9.3. Electron bond populations -- 9.4. Degree of electron transfer -- 9.5. Conclusions 
505 8 |a 10. Construction of growth reaction pathways -- 10.1. Simulation of an experimentally suggested c-BN growth mechanism 
505 8 |a 11. Other types of material growth in a CVD reactor -- 11.1. Diamond-to-graphene transformation. 
520 3 |a Chemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. 
521 |a Researchers active in the field of CVD. 
530 |a Also available in print. 
538 |a Mode of access: World Wide Web. 
538 |a System requirements: Adobe Acrobat Reader, EPUB reader, or Kindle reader. 
545 |a Karin Larsson is a Professor Emerita of Inorganic Chemistry at the Department of Chemistry-Angstrom Laboratory, Uppsala University, Sweden.  
588 0 |a Title from PDF title page (viewed on January 9, 2023). 
650 0 |a Chemical vapor deposition. 
650 7 |a Surface chemistry & adsorption.  |2 bicssc 
650 7 |a TECHNOLOGY & ENGINEERING / Materials Science / Thin Films, Surfaces & Interfaces.  |2 bisacsh 
710 2 |a Institute of Physics (Great Britain),  |e publisher. 
776 0 8 |i Print version:  |z 9780750331050  |z 9780750331081 
830 0 |a IOP (Series).  |p Release 22. 
830 0 |a IOP ebooks.  |p 2022 collection. 
856 4 0 |u https://iopscience.uam.elogim.com/book/mono/978-0-7503-3107-4  |z Texto completo 

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