Efficient extreme ultraviolet mirror design : an FDTD approach /

Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Lee, Yen-Min (Autor)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Bristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) : IOP Publishing, [2021]
Colección:IOP (Series). Release 21.
IOP series in advances in optics, photonics and optoelectronics.
IOP ebooks. 2021 collection.
Temas:
Extreme ultraviolet lithography.
Mirrors > Design and construction.
Finite differences > Data processing.
Time-domain analysis.
Optical physics.
Optics and photonics.
Acceso en línea:Texto completo
Tabla de Contenidos:
  • 1. Introduction to optical lithography
  • 1.1. Principle of optical lithography
  • 1.2. Evolution and history
  • 1.3. Interrelation with IC manufacturing
  • 1.4. The next-generation optical lithography : extreme ultraviolet (EUV) lithography
  • 2. Multilayer mirrors in extreme ultraviolet lithography
  • 2.1. Composition and fabrication
  • 2.2. ML based EUV photomasks
  • 2.3. Multilayer mirror physics
  • 2.4. Quarter-wavelength EUV mirror (Bragg mirror)
  • 2.5. Photonic crystal (PHC) EUV mirror
  • 3. Efficient finite-difference time-domain (FDTD) approach
  • 3.1. Numerical methods for EUV mirror design
  • 3.2. FDTD expression for Maxwell's equation
  • 3.3. Boundary conditions
  • 3.4. Efficient FDTD method--the equivalent layer approach
  • 4. Simulation cases
  • 4.1. 2D simulation : EUV mirror with surface roughness
  • 4.2. 3D simulation : EUV mirror patterned with periodic contact holes
  • 4.3. 3D simulation : porous EUV mirror
  • 5. Summaries and challenges
  • 5.1. Summaries
  • 5.2. Challenges.

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