Efficient extreme ultraviolet mirror design : an FDTD approach /
Extreme ultraviolet (EUV) lithography is a next generation platform with the potential to extend Moore's Law. The EUV mirror is a fundamental component of this system. Efficient Extreme Ultraviolet Mirror Design describes an approach to designing EUV mirrors with reduced computational time and...
Clasificación: | Libro Electrónico |
---|---|
Autor principal: | Lee, Yen-Min (Autor) |
Formato: | Electrónico eBook |
Idioma: | Inglés |
Publicado: |
Bristol [England] (Temple Circus, Temple Way, Bristol BS1 6HG, UK) :
IOP Publishing,
[2021]
|
Colección: | IOP (Series). Release 21.
IOP series in advances in optics, photonics and optoelectronics. IOP ebooks. 2021 collection. |
Temas: | |
Acceso en línea: | Texto completo |
Ejemplares similares
-
Extreme ultraviolet lithography /
Publicado: (2009) -
EUV sources for lithography /
Publicado: (2006) -
Advances in FDTD computational electrodynamics : photonics and nanotechnology /
Publicado: (2013) -
Advanced FDTD Methods : Parallelization, Acceleration, and Engineering Applications.
por: Yu, Wenhua
Publicado: (2011) -
Ultraviolet Laser Technology and Applications.
por: Elliott, David L.
Publicado: (1995)