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201128s2021 sz o 100 0 eng d |
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|a UAMI
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|a Mertens, Paul W.
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|a Ultra Clean Processing of Semiconductor Surfaces XV
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|a Zurich :
|b Trans Tech Publications, Limited,
|c 2021.
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|a 1 online resource (325 pages)
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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|a Solid State Phenomena Ser. ;
|v v. Volume 314
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|a Print version record.
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|a Selected peer-reviewed full text papers from the 15th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) Selected, peer-reviewed papers from the 15-th International Symposium on Ultra Clean Processing of Semiconductor Surfaces (UCPSS), April 12-15, 2021, Mechelen, Belgium.
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|a Intro -- Ultra Clean Processing of Semiconductor Surfaces XV -- Preface -- Table of Contents -- Chapter 1: Contamination and Contamination Control -- Surface Cleaning Challenges for Organic Light Emitting Diodes -- Characterization and Removal of Metallic Contamination in H2O and H2O2 Using Single Particle Inductively Coupled Plasma Mass Spectrometry -- Direct Analysis of Ultra Trace Metallic Particles in NH3 and HCl Gases by Gas Exchange Device (GED)-ICP-MS -- Investigation of Contaminants in Single Wafer Wet Cleaning Using Isopropyl Alcohol
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|a Cl-Containing Microplastics from the Environment -- Experimental Wafer Carrier Contamination Analysis and Monitoring in Fully Automated 300 mm Power Production Lines -- Wafer Container Monitoring Concerning Airborne Molecular Contaminations along a 300 mm Power Semiconductor Production Flow -- Chapter 2: FEOL: Surface Chemistry and Etching of Group IV Semiconductors -- Towards Si-Cap-Free SiGe Passivation: Impact of Surface Preparation on Low-Pressure Oxidation of SiGe -- Wet Chemical Cleaning of Organosilane Monolayers -- Reaction Kinetics of Poly-Si Etching in TMAH Solution
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|a Surface Chemistry and Nanoscale Wet Etching of Group IV Semiconductors in Acidic H2O2 Solutions -- Si1-XGeX Selective Etchant for Gate-All-Around Transistors -- Chapter 3: FEOL: Surface Chemistry and Etching of III-V Compound Semiconductors -- GaN MOS Structures with Low Interface Trap Density -- Analysis of Surface Reaction for Group III-V Compound Semiconductors in Functional Water -- Effect of Surface Oxidation on the Material Loss of InGaAs in Acidic Solutions -- Characterization of Wet Chemical Atomic Layer Etching of InGaAs
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|a Chapter 4: FEOL: Etch Dielectric Films and Removal of Masking Films -- Highly Selective Etching between Different Oxide Films by Vapor Phase Cleaning -- Silicon Corrosion during Selective Silicon Nitride Etch with Hot Diluted Hydrofluoric Acid -- Kinetic Study on the Si3N4 Etching in Superheated Water -- Challenges and Solutions of Replacement Metal Gate Patterning to Enable Gate-all-Around Device Scaling -- Removal of SOC Hard Mask for Patterning of Work Function Metal by Thermally Activated Ozone Gas
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|a High Performance, Eco-Friendly SPM Cleaning Technology Using Integrated Bench-Single Wafer Cleaning System -- Chapter 5: Wet Processing in Narrow Spaces and Pattern Collapse -- Polydimethylsiloxane Micro-Channels Application for the Study of Dynamic Wetting of Nano-Etched Silicon Surfaces Based on Acoustic Characterization Method -- Characterization of Wetting of Deep Silica Nanoholes by Aqueous Solutions Using ATR-FTIR -- Effect of Hydrophobicity and Surface Potential of Silicon on SiO2 Etching in Nanometer-Sized Narrow Spaces
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590 |
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|a eBooks on EBSCOhost
|b EBSCO eBook Subscription Academic Collection - Worldwide
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650 |
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|a Semiconductors
|x Surfaces
|v Congresses.
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650 |
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6 |
|a Semi-conducteurs
|x Surfaces
|v Congrès.
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650 |
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7 |
|a Semiconductors
|x Surfaces
|2 fast
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655 |
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7 |
|a Conference papers and proceedings
|2 fast
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700 |
1 |
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|a Wostyn, Kurt.
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700 |
1 |
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|a Meuris, Marc.
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700 |
1 |
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|a Heyns, Marc.
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776 |
0 |
8 |
|i Print version:
|a Mertens, Paul W.
|t Ultra Clean Processing of Semiconductor Surfaces XV.
|d Zurich : Trans Tech Publications, Limited, ©2021
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830 |
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0 |
|a Solid State Phenomena Ser.
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856 |
4 |
0 |
|u https://ebsco.uam.elogim.com/login.aspx?direct=true&scope=site&db=nlebk&AN=2683123
|z Texto completo
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938 |
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|a ProQuest Ebook Central
|b EBLB
|n EBL6402731
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938 |
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|a EBSCOhost
|b EBSC
|n 2683123
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