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Lithography : principles, processes and materials /
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
New York :
Nova Science,
c2011.
|
| Colección: | Engineering tools, techniques and tables.
Nanotechnology science and technology series. |
| Temas: | |
| Acceso en línea: | Texto completo |
MARC
| LEADER | 00000cam a2200000 i 4500 | ||
|---|---|---|---|
| 001 | EBSCO_on1162225843 | ||
| 003 | OCoLC | ||
| 005 | 20231017213018.0 | ||
| 006 | m o d | ||
| 007 | cr ||||||||||| | ||
| 008 | 100820s2011 nyua ob 001 0 eng | ||
| 010 | |a 2020688404 | ||
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| 020 | |a 9781611221237 |q ebook | ||
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| 020 | |z 9781617618376 |q hardcover | ||
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| 072 | 7 | |a TEC |x 008010 |2 bisacsh | |
| 082 | 0 | 0 | |a 621.3815/31 |2 22 |
| 049 | |a UAMI | ||
| 245 | 0 | 0 | |a Lithography : |b principles, processes and materials / |c Theodore C. Hennessy, editor. |
| 264 | 1 | |a New York : |b Nova Science, |c c2011. | |
| 300 | |a 1 online resource. | ||
| 336 | |a text |b txt |2 rdacontent | ||
| 337 | |a computer |b c |2 rdamedia | ||
| 338 | |a online resource |b cr |2 rdacarrier | ||
| 490 | 1 | |a Engineering tools, techniques and tables | |
| 490 | 1 | |a Nanotechnology science and technology | |
| 500 | |a Includes bibliographical references and index. | ||
| 588 | |a Description based on print version record. | ||
| 504 | |a ""REFERENCES""""LITHOGRAPHY: PRINCIPLES,PROCESSES AND MATERIALS""; ""ABSTRACT""; ""1. INTRODUCTION""; ""2. PRINCIPLE OF LITHOGRAPHY""; ""3. PROCESSES OF LITHOGRAPHY""; ""3.1. RIE-NSL Lithography [32]""; ""3.2. FIB Lithography""; ""3.3. Laser Interference Lithography""; ""4. MATERIALS OF LITHOGRAPHY""; ""4.1. Materials of RIE-NSL Lithography""; ""4.2. Materials of FIB Lithography""; ""4.3. Materials of Laser Interference Lithography""; ""5. CONCLUSIONS""; ""REFERENCES""; ""LASER INTERFERENCE LITHOGRAPHY""; ""ABSTRACT""; ""1. INTRODUCTION""; ""2. THEORY""; ""3. INSTRUMENTATION"" | ||
| 504 | |a Includes bibliographical references and index. | ||
| 505 | 0 | |a ""LITHOGRAPHY:PRINCIPLES, PROCESSES AND MATERIALS""; ""CONTENTS""; ""PREFACE""; ""PRINCIPLE, PROCESSES AND MATERIALS FOR NANO IMPRINT LITHOGRAPHY""; ""1. INTRODUCTION""; ""2. PRINCIPLE AND FUNDAMENTAL PROCESS FOR NIL""; ""2.1. Principle of NIL""; ""2.2. Theoretical Analysis for NIL""; ""2.3. Fundamental Process for NIL""; ""3. VARIATIONS OF NIL PROCESSES""; ""3.1. Combined Thermal and UV-NIL""; ""3.2. Reverse Imprint Process""; ""3.3. Laser-Assisted Direct Imprint""; ""3.4. Roll Imprint Process""; ""3.5. Substrate Conformal Imprint Lithography (SCIL)""; ""3.6. Large Area Imprint"" | |
| 505 | 8 | |a ""3.7. Nanoelectrode Lithography""""3.8. Hybrid NIL Process""; ""3.9. Metal Nanoparticle Nanoimprinting Process""; ""3.10. High Resolution NIL""; ""3.11. Other NIL Processes""; ""4. NIL MATERIALS""; ""4.1. NIL Resists""; ""4.2. Functional Materials and Other Imprintable Materials""; ""4.3. Mold Materials""; ""5. PROSPECTS AND CHALLENGES IN NIL""; ""6. CONCLUSION""; ""ACKNOWLEDGMENTS""; ""REFERENCES""; ""NANOFABRICATION IN ELECTRONBEAM LITHOGRAPHY""; ""1. ELECTRON BEAM LITHOGRAPHY OVERVIEW""; ""1.1. Introduction to the Electron Beam Lithography System""; ""1.2. Proximity Effect"" | |
| 505 | 8 | |a ""1.3. Numerical Calculation of the E-beam (Monte Carlo Method)""""2. CARBON NANOTUBE (CNT) BASED DEVICES""; ""2.1.Introduction to carbon nanotubes ""; ""2.2. VACNT Based FE Device with Individual Cathode Structures""; ""2.3. Field Emission Properties of Single Vertically Aligned Carbon Nanotubes""; ""2. VARIO""; ""2.4. Application in Micro CNT Column System""; ""3. FABRICATION OF 3D NANOSTRUCTURES ON CYLINDRICAL ROLLERS""; ""3.1. Introduction to Nanolithography""; ""3.2. In-House Field Emission Measurement Facility""; ""4. CONCLUSIONS""; ""ACKNOWLEDGMENT""; ""REFERENCES"" | |
| 505 | 8 | |a ""GENERATION OF MICRO PATTERNS ONSIDE SURFACES OF POLYMER AND SISUBSTRATES USING A MICROPUNCHING LITHOGRAPHY APPROACH""""ABSTRACT""; ""1. INTRODUCTION""; ""2. MACROPUNCHING METHOD AND MPL""; ""3. AU SIDEWALL PATTERNS ON HDPE CHANNELS""; ""3.1. Fabrication Procedure""; ""3.2. Experimental Results and Discussions""; ""4. SUPER HYDROPHOBIC PDMS CHANNELS""; ""4.1. Fabrication Process""; ""4.2. Experimental Results and Discussions""; ""5. FABRICATION OF AU DOTS ON SI SIDEWALLS""; ""5.1. Fabrication Procedures""; ""5.2. Results and Discussions""; ""6. SUMMARY AND CONCLUSIONS""; ""ACKNOWLEDGMENTS"" | |
| 546 | |a English. | ||
| 590 | |a eBooks on EBSCOhost |b EBSCO eBook Subscription Academic Collection - Worldwide | ||
| 650 | 0 | |a Microlithography. | |
| 650 | 0 | |a Microfabrication. | |
| 650 | 6 | |a Microlithographie. | |
| 650 | 6 | |a Microfabrication. | |
| 650 | 7 | |a TECHNOLOGY & ENGINEERING |x Electronics |x Circuits |x General. |2 bisacsh | |
| 650 | 7 | |a Microfabrication |2 fast | |
| 650 | 7 | |a Microlithography |2 fast | |
| 700 | 1 | |a Hennessy, Theodore C. | |
| 776 | 0 | 8 | |i Print version: |t Lithography |d New York : Nova Science, c2011. |z 9781617618376 (hardcover) |w (DLC) 2010033078 |
| 830 | 0 | |a Engineering tools, techniques and tables. | |
| 830 | 0 | |a Nanotechnology science and technology series. | |
| 856 | 4 | 0 | |u https://ebsco.uam.elogim.com/login.aspx?direct=true&scope=site&db=nlebk&AN=367184 |z Texto completo |
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| 938 | |a ebrary |b EBRY |n ebr10659070 | ||
| 938 | |a EBSCOhost |b EBSC |n 367184 | ||
| 938 | |a YBP Library Services |b YANK |n 6901989 | ||
| 994 | |a 92 |b IZTAP | ||