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The formation of structural imperfections in semiconductor silicon /

"Today, it is difficult to imagine all spheres of human activity without personal computers, solid-state electronic devices, micro- and nanoelectronics, photoconverters, and mobile communication devices. The basic material of modern electronics and for all of these industries is semiconductor s...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autores principales: Talanin, V. I. (Vitaliĭ Igorʹevich) (Autor), Talanin, I. E. (Igor Evgenievich) (Autor)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Newcastle upon Tyne, UK : Cambridge Scholars Publishing, 2018.
Temas:
Acceso en línea:Texto completo
Tabla de Contenidos:
  • Chapter one. Growth of dislocation-free silicon single crystals from melt and defect formation
  • Chapter two. Physical modeling of defect formation processes in dislocation-free single crystals of silicon
  • Chapter three. Physical basis of a heterogenous (two-stage) model of grown-in microdefect formation
  • Chapter four. High-temperature precipitation of impurity in dislocation-free silicon single crystals
  • Chapter five. The formation of microvoids and interstitial dislocation loops during crystal cooling after growing
  • Chapter six. General approach to the engineering of defects in semiconductor silicon.