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The formation of structural imperfections in semiconductor silicon /

"Today, it is difficult to imagine all spheres of human activity without personal computers, solid-state electronic devices, micro- and nanoelectronics, photoconverters, and mobile communication devices. The basic material of modern electronics and for all of these industries is semiconductor s...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autores principales: Talanin, V. I. (Vitaliĭ Igorʹevich) (Autor), Talanin, I. E. (Igor Evgenievich) (Autor)
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Newcastle upon Tyne, UK : Cambridge Scholars Publishing, 2018.
Temas:
Acceso en línea:Texto completo

MARC

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100 1 |a Talanin, V. I.  |q (Vitaliĭ Igorʹevich),  |e author. 
245 1 4 |a The formation of structural imperfections in semiconductor silicon /  |c by V.I. Talanin and I.E. Talanin. 
264 1 |a Newcastle upon Tyne, UK :  |b Cambridge Scholars Publishing,  |c 2018. 
300 |a 1 online resource (xii, 269 pages) :  |b illustrations 
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520 |a "Today, it is difficult to imagine all spheres of human activity without personal computers, solid-state electronic devices, micro- and nanoelectronics, photoconverters, and mobile communication devices. The basic material of modern electronics and for all of these industries is semiconductor silicon. Its properties and applications are determined by defects in its crystal structure. However, until now, there has been no complete and reliable description of the creation and transformation of such a defective structure. This book solves this mystery through two different approaches to semiconductor silicon: the classical and the probabilistic. This book brings together, for the first time, all existing experimental and theoretical information on the internal structure of semiconductor silicon. It will appeal to a wide range of readers, from materials scientists and practical engineers to students."--  |c Back cover 
504 |a Includes bibliographical references (pages 239-267). 
505 0 |a Chapter one. Growth of dislocation-free silicon single crystals from melt and defect formation -- Chapter two. Physical modeling of defect formation processes in dislocation-free single crystals of silicon -- Chapter three. Physical basis of a heterogenous (two-stage) model of grown-in microdefect formation -- Chapter four. High-temperature precipitation of impurity in dislocation-free silicon single crystals -- Chapter five. The formation of microvoids and interstitial dislocation loops during crystal cooling after growing -- Chapter six. General approach to the engineering of defects in semiconductor silicon. 
588 0 |a Print version record. 
590 |a eBooks on EBSCOhost  |b EBSCO eBook Subscription Academic Collection - Worldwide 
650 0 |a Silicon  |x Structure. 
650 0 |a Semiconductors  |x Impurity distribution. 
650 0 |a Semiconductors  |x Materials. 
650 6 |a Silicium  |x Structure. 
650 6 |a Semi-conducteurs  |x Diffusion des impuretés. 
650 6 |a Semi-conducteurs  |x Matériaux. 
650 7 |a Condensed matter physics (liquid state & solid state physics)  |2 bicssc 
650 7 |a Materials science.  |2 bicssc 
650 7 |a Mathematical modelling.  |2 bicssc 
650 7 |a TECHNOLOGY & ENGINEERING  |x Mechanical.  |2 bisacsh 
650 7 |a Semiconductors  |x Impurity distribution  |2 fast 
650 7 |a Semiconductors  |x Materials  |2 fast 
700 1 |a Talanin, I. E.  |q (Igor Evgenievich),  |e author. 
776 0 8 |i Print version:  |a Talanin, V.I. (Vitaliĭ Igorʹevich).  |t Formation of structural imperfections in semiconductor silicon.  |d Newcastle upon Tyne, UK : Cambridge Scholars Publishing, 2018  |z 1527506355  |w (OCoLC)1019739852 
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