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Optical spectroscopy : technology, properties and performance /
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
New York :
Nova Publishers,
[2014]
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| Colección: | Lasers and electro-optics research and technology series.
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| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- OPTICAL SPECTROSCOPY: TECHNOLOGY, PROPERTIES AND PERFORMANCE; Library of Congress Cataloging-in-Publication Data; Contents; Preface; Chapter 1: Optical Emission Spectroscopy Used to Investigate Plasma Deposition of Thin Solid Films; Abstract; 1. Introduction; 2. Processes in Plasma; 3. Spectroscopy with Plasma Light; 4. Experimental Set-up; 4.1. OES on Plasmas Used to Deposit SiOx Thin Films by rf Magnetron Reactive Sputtering; 4.1.1. OES for Sputtered Silicon Atoms; 4.1.2. The Provenience of the OES Oxygen Line; 4.1.3. From OES Data to the Composition of the Deposited SiOx Layer.
- 4.2. OES on Plasmas Used to Deposit a-C:H Thin Films by PECVD4.2.1. Introductive Notions on the PECVD Deposition of a-C:H; 4.2.2. OES Spectra of Various CH4 Plasmas: The Main Lines; 4.2.3. Ideas for Process Characterization and Method Calibration; Conclusion; References; Chapter 2: Reflectance Spectroscopy; INQUIMAE/ Dpto. de Química Inorgánica, Analítica y Química; Física, Facultad de Ciencias Exactas y Naturales. Universidad; de Buenos Aires, Ciudad Universitaria,; Buenos Aires, Argentina; Abstract; 1. Absorption, Transmission and Reflection of Light. Specular and Diffuse Reflection.
- 2. Kubelka Munk Theory. The Remission Function3. Pile of Plates Model; 4. Reflectance and Particle Size; 5. Measurement of Reflectance; 5.1. UV-visible-NIR Reflection; 5.2. IR Reflection Techniques; 5.3. Time-resolved Reflectance; 6. Applications of Reflectance Spectroscopy; 6.1. Chromophore Concentrations from Reflected Light; 6.2. Remote Sensing, Plant Physiology and Ecological Studies; 6.3. Diseases Diagnosis; 6.4. Cultural Heritage Objects; 6.5. Other Applications; Conclusion; References; Links.
- Chapter 3: Photoreflectance Spectroscopy of Franz-Keldysh Oscillations from Semiconductor Heterostructures for Electronic and Optoelectronic Devices and ComponentsAbstract; I. Introduction; II. Experimental Setup for the Photoreflectance Measurements; III. Franz-Keldysh Oscillations Appearing in Bulk Single Crystals and Simple Epitaxial Structures: In the Absence of the Effects of the Interference Effects of the Probe Light Beam; VI. Franz-Keldysh Oscillations in the Epitaxial Structures: In the Presence of the Effects of the Interference of the Probe Light Beam.
- V. Franz-Keldysh Oscillations in the AlxGa1-xN/GaN Hetero structures: High Sensitivity to the Surface MorphologyVI. Estimation of the Built-in Electric Field Strength and Direction with Simultaneous Use of Photoreflectance Spectroscopy and Terahertz Spectroscopy; VII. Application of the Franz-Keldysh Oscillation to the Structure Desing of the Terahertz Wave Emitters; Conclusion; References; Chapter 4: IR Attenuated Total Reflection: A Tool to Investigate Liquid Penetration in Paper: Theoretical Considerations; Abstract; 1. Introduction; 2. On the Atr Method: Theoretical Considerations.