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Measurement technology and intelligent instruments XI : selected, peer reviewed papers from the 11th International Symposium on Measurement Technology and Intelligent Instruments, (ISMTII 2013), July 1-3, 2013, Aachen, Germany /
Collection of selected, peer reviewed papers from the 11th International Symposium on Measurement Technology and Intelligent Instruments (ISMTII 2013), July 1-3, 2013, Aachen, Germany. The 60 papers are grouped as follows: Chapter 1: Metrology for SI, Chapter 2: Position & Displacement Metrology...
| Clasificación: | Libro Electrónico |
|---|---|
| Autor Corporativo: | |
| Otros Autores: | , |
| Formato: | Electrónico Congresos, conferencias eBook |
| Idioma: | Inglés |
| Publicado: |
Zürich, Switzerland :
Trans Tech Publications,
2014.
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| Colección: | Key engineering materials ;
v. 613. |
| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Measurement Technology and Intelligent Instruments XI; Editorial; Table of Contents; Chapter 1: Metrology for SI; Revision of the SI: The Determination of the Avogadro Constant as the Base for the Kilogram; Characterizing the New Sphere Interferometer for the Diameter Determination of the Avogadro Spheres; New Avogadro Spheres for the Redefinition of the Kilogram; Recommendations for Unified Rules for Key Comparison Evaluation; Chapter 2: Position & Displacement Metrology; Reproducibility of a Nanometre Accurate Moving-Scale Measurement System
- Error Separation and Dynamic Compensation Method in Coplanar Planar Grating Displacement Measurement SystemHighly-Stable Electronic Sensor Interface for Capacitive Position Measurement; Model and Measurement Method of Optical Nonlinearities Caused by the Heterodyne and Homodyne Interference Terms in the Heterodyne Interferometer; Orthogonality Measurement of Cross-Grating Based on Image Processing of Multi-Order Diffraction Patterns; Research on a Long Travel Nanopositioning Air Bearing Stage with the Linear Motors; Chapter 3: Micro- and Nanometrology
- Changing Technology Requirements of Mask Metrology in Semiconductor IndustryAutomated Tool for Measuring Nanotopography of 300 mm Wafers at early Stages of Wafer Production; Full Scale Calibration of a Combined Tactile Contour and Roughness Measurement Device; A Virtual Instrument for SEM Uncertainty Analysis; Chapter 4: Macrometrology; Super-Large Gear Measurement Using Laser Tracker and CMM; Experimental Performance Study of Industrial-Grade Coordinate Measuring Machines Using a Calibrated Production Workpiece; Analysis of a Big Joint Implant
- High Stability of Temperature Control Using Vacuum Insulated Wall for Gauge Block MeasurementChapter 5: Optical Metrology; First Utilization of Energy Transfer in Structured Light Projection
- Infrared 3D Scanner; High Precision Algorithms for 3D Objects Shadow Inspection in Partially Coherent Light; Measuring Parallelism for Two Thin Parallel Beams Based on Autocollimation Principle; Realization of Non-Mechanical Lateral and Axial Confocal Microscopic Laser Scanning with a Phase only Liquid Crystal Spatial Light Modulator
- An Approach to On-Line Uncertainty Evaluation in Non-Contact Temperature MeasurementsChapter 6: Sensors and Actuators; Design and Testing of Wind Energy Harvester Based on PVDF; Investigation of Energy Harvest Using a Piezoelectric Unimorph Post-Buckled by a Stretching Spring; Development of a Compact Deformable Mirror Using Push-Pull Actuators; Self-Diagnostics of Piezoelectric Transducers; Evaluation of the Transient Temperature Distribution of End-Face Sliding Friction Pair Using Infrared Thermometry; IEEE 1451-Based Sensor Interfacing and Data Fusion for Fire Smoke Detection