Ion Implantation and Activation - Volume 1.

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Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory...

Descripción completa

Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor principal: Suzuki, Kunihiro
Formato: Electrónico eBook
Idioma:Inglés
Publicado: Sharjah : Bentham Science Publishers, 2013.
Colección:Ion Implantation and Activation.
Temas:
Ion implantation > Computer simulation.
Semiconductors > Design and construction > Computer simulation.
Alloys.
Semiconductors.
Ion implantation.
Alloys
Semiconductors
Alliages.
Ions > Implantation.
Semi-conducteurs.
Ions > Implantation > Simulation par ordinateur.
alloy.
semiconductor.
TECHNOLOGY & ENGINEERING > Mining.
Ion implantation
Ion implantation > Computer simulation
Acceso en línea:Texto completo
Descripción
Sumario:Ion Implantation and Activation presents the derivation process of related models in a comprehensive step by step manner starting from the fundamental processes and moving up into the more advanced theories. Chapters in the book explain, in depth, various topics such as Pearson functions, LSS theory, Monte Carlo simulations, Edgeworth Polynomials and much more. This book provides advanced engineering and physics students and researchers with complete and coherent coverage of modern semiconductor process modeling.
Descripción Física:1 online resource (464 pages)
ISBN:9781608057818
160805781X

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