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003 OCoLC
005 20231017213018.0
006 m o d
007 cr |||||||||||
008 130411s2013 nyu ob 001 0 eng
010 |a  2020687136 
040 |a DLC  |b eng  |e rda  |c DLC  |d E7B  |d YDXCP  |d OCLCF  |d MEU  |d EBLCP  |d AGLDB  |d VTS  |d AU@  |d M8D  |d N$T  |d OCLCO  |d AJS  |d OCLCO  |d OCLCQ  |d OCLCO 
019 |a 858126055 
020 |z 9781626180345  |q (ebook) 
020 |a 9781624179594  |q (hardcover) 
020 |a 1624179592 
020 |a 1626180342  |q (electronic bk.) 
020 |a 9781626180345  |q (electronic bk.) 
029 1 |a AU@  |b 000062327189 
029 1 |a DEBBG  |b BV043779354 
029 1 |a NZ1  |b 15195150 
029 1 |a DEBSZ  |b 45073952X 
035 |a (OCoLC)854583694  |z (OCoLC)858126055 
041 1 |a eng  |h rus 
050 0 0 |a TK7871.15.S55 
072 7 |a TEC  |x 008010  |2 bisacsh 
082 0 0 |a 621.3815/31  |2 23 
049 |a UAMI 
100 1 |a Vasilʹev, V. I͡U.  |q (Vladislav I͡Urʹevich) 
240 1 0 |a Tonkie sloi borofosforosilikatnogo stekla v tekhnologii kremnievoæi mikroçelektroniki.  |l English 
245 1 0 |a Borophosphosilicate glass thin films in electronics /  |c Vladislav Yu. Vasilyev. 
264 1 |a New York :  |b Nova Science Publishers,  |c [2013] 
300 |a 1 online resource. 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
490 1 |a Materials science and technologies 
490 0 |a Electronics and telecommunications research 
500 |a Translation of: Tonkie sloi borofosforosilikatnogo stekla v tekhnologii kremnievoĭ mikroėlektroniki. 
504 |a Includes bibliographical references (pages 221-234) and index. 
588 |a Description based on print version record and CIP data provided by publisher. 
505 0 |a BOROPHOSPHOSILICATE GLASS THIN FILMS IN ELECTRONICS ; Library of Congress Cataloging-in-Publication Data ; CONTENTS ; PREFACE ; LIST OF ABBREVIATIONS (IN ORDER OF APPEARANCE) ; LIST OF IMPORTANT SYMBOLS (IN ORDER OF APPEARANCE); INTRODUCTION ; PART 1. BPSG THIN FILM DEPOSITION; Chapter 1 BRIEF HISTORICAL OVERVIEW OF BPSG THIN FILM RESEARCH ; Chapter 2 BASIC BPSG FILM CVD TOOLS AND METHODOLOGY ; 2.1. CVD PROCESS COMPOUNDS ; 2.2. BASIC CVD TOOL DESIGN FOR SILICON DIOXIDE AND GLASS FILM DEPOSITION ; 2.3. SOME BASIC THIN FILM CVD PROCESS PARAMETERS. 
505 8 |a Chapter 3 BASIC BPSG CVD KINETIC FEATURES 3.1. BASIC THIN FILM CVD KINETIC FEATURES ; 3.2. BASIC SILICON DIOXIDE THIN FILM CVD KINETIC FEATURES ; 3.3. BASIC SILICATE GLASS THIN FILM CVD KINETIC FEATURES ; 3.4. BASIC AEROSOL FORMATION FEATURES AT GLASS CVD ; Chapter 4 AS-DEPOSITED BPSG FILM STEP COVERAGE AND GAP-FILL ; 4.1. BASIC DEFINITIONS OF STEPPED DEVICE STRUCTURES ; 4.2. BASIC DEFINITIONS FOR THIN FILM CVD ON STEPPED DEVICE STRUCTURES ; 4.3. CHARACTERIZATION OF CVD PROCESSES ON STEPPED STRUCTURES ; 4.4. IMPROVEMENT OF GLASS FILM CVD ON STEPPED STRUCTURES. 
505 8 |a Chapter 5 GLASS FILM CVD SCHEMES 5.1. GENERAL THIN FILM CVD PROCESS SCHEME ; 5.2. CVD THIN FILM DEPOSITION PROCESSES CLASSIFICATION ; 5.3. THIN FILM SIO AND SILICATE GLASS DEPOSITION PROCESSES SCHEMES 2; Chapter 6 BPSG FILM INDUSTRIAL CVD TECHNOLOGY ; FINAL REMARKS ON PART 1 ; PART 2. BPSG FILM COMPOSITION, STRUCTURE, AND PROPERTIES ; Chapter 7 BRIEF REVIEW ON BPSG THIN FILM ANALYSIS TECHNIQUES ; 7.1. ANALYTICAL METHODS OVERVIEW ; 7.2. FTIR METHOD IMPLEMENTATION BPSG FILM COMPOSITION ANALYSIS ; 7.3. LASER SCANNING METHOD ; 7.4. MICROSCOPY METHODS. 
505 8 |a 7.5. TOTAL CHARGE MAPPING METHODS 7.6. SECONDARY ION MASS SPECTROMETRY METHOD ; Chapter 8 BPSG FILM COMPOSITION ; Chapter 9 BPSG FILM STRUCTURE ; 9.1. BRIEF REVIEW OF SILICA STRUCTURE: BASICS AND TERMS ; 9.2. BRIEF REVIEW OF BORON OXIDE AND PHOSPHORUS OXIDE STRUCTURES ; 9.3. BPSG COMPOSITION AND STRUCTURE ; 9.4. DIFFERENCES IN BPSG COMPOSITION AND STRUCTURE ; Chapter 10 BASIC BPSG FILM PROPERTIES ; 10.1. SURFACE MORPHOLOGY OF THIN GLASS FILMS ; 10.2. FILM MECHANICAL STRESS ; 10.3. FILM DENSITY -- FILM POROSITY -- FILM SHRINKAGE ; 10.4. FILM WET ETCH RATE. 
505 8 |a 10.5. GETTERING PROPERTIES OF BPSG FILMS10.6. ELECTRICAL PROPERTIES OF BPSG FILMS ; 10.7. SUMMARIES OF BPSG FILM PROPERTIES FOR PRODUCTION PROCESSES ; Chapter 11 BPSG FILM FLOW CAPABILITY ; 11.1. BRIEF DESCRIPTION OF GLASS FLOW BASICS ; 11.2. GLASS STRUCTURE FEATURES AND GLASS FLOW CAPABILITY ; 11.3. APPLICATION OF BULK GLASS PARAMETERS TO GLASS THIN FILM ; Chapter 12 BPSG FILM -- AMBIENT MOISTURE INTERACTION ; 12.1. TECHNIQUE FOR ANALYSIS OF MOISTURE EFFECTS IN THIN GLASS FILMS ; 12.2. FILM-MOISTURE INTERACTION ; 12.3. DESCRIPTION OF MOISTURE ABSORPTION EFFECTS IN BPSG FILMS. 
546 |a Text in English. 
590 |a eBooks on EBSCOhost  |b EBSCO eBook Subscription Academic Collection - Worldwide 
650 0 |a Electronic apparatus and appliances  |x Materials. 
650 0 |a Glass coatings. 
650 0 |a Boron compounds. 
650 0 |a Silicon compounds. 
650 0 |a Glass manufacture  |x Chemistry. 
650 2 |a Boron Compounds 
650 2 |a Silicon Compounds 
650 6 |a Verre  |x Revêtements protecteurs. 
650 6 |a Bore  |x Composés. 
650 6 |a Silicium  |x Composés. 
650 7 |a TECHNOLOGY & ENGINEERING  |x Electronics  |x Circuits  |x General.  |2 bisacsh 
650 7 |a Boron compounds  |2 fast 
650 7 |a Electronic apparatus and appliances  |x Materials  |2 fast 
650 7 |a Glass coatings  |2 fast 
650 7 |a Glass manufacture  |x Chemistry  |2 fast 
650 7 |a Silicon compounds  |2 fast 
700 1 |a Vasilʹev, V. I͡U.  |q (Vladislav I͡Urʹevich) 
776 0 8 |i Print version:  |t Borophosphosilicate glass thin films in electronics  |d New York : Nova Science Publishers, Inc., [2013]  |z 9781624179594 (hardcover)  |w (DLC) 2013002527 
830 0 |a Materials science and technologies series. 
856 4 0 |u https://ebsco.uam.elogim.com/login.aspx?direct=true&scope=site&db=nlebk&AN=619652  |z Texto completo 
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938 |a EBSCOhost  |b EBSC  |n 619652 
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938 |a ProQuest Ebook Central  |b EBLB  |n EBL3022846 
994 |a 92  |b IZTAP