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130411s2013 nyu ob 001 0 eng |
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|a 2020687136
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|a 858126055
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|z 9781626180345
|q (ebook)
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|a 9781624179594
|q (hardcover)
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|a 1624179592
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|q (electronic bk.)
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|a 9781626180345
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|z (OCoLC)858126055
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|a eng
|h rus
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|a TK7871.15.S55
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|a TEC
|x 008010
|2 bisacsh
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|a 621.3815/31
|2 23
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|a UAMI
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|a Vasilʹev, V. I͡U.
|q (Vladislav I͡Urʹevich)
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|a Tonkie sloi borofosforosilikatnogo stekla v tekhnologii kremnievoæi mikroçelektroniki.
|l English
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|a Borophosphosilicate glass thin films in electronics /
|c Vladislav Yu. Vasilyev.
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264 |
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|a New York :
|b Nova Science Publishers,
|c [2013]
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|a 1 online resource.
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|a text
|b txt
|2 rdacontent
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|a computer
|b c
|2 rdamedia
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|a online resource
|b cr
|2 rdacarrier
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490 |
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|a Materials science and technologies
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|a Electronics and telecommunications research
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|a Translation of: Tonkie sloi borofosforosilikatnogo stekla v tekhnologii kremnievoĭ mikroėlektroniki.
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|a Includes bibliographical references (pages 221-234) and index.
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|a Description based on print version record and CIP data provided by publisher.
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|a BOROPHOSPHOSILICATE GLASS THIN FILMS IN ELECTRONICS ; Library of Congress Cataloging-in-Publication Data ; CONTENTS ; PREFACE ; LIST OF ABBREVIATIONS (IN ORDER OF APPEARANCE) ; LIST OF IMPORTANT SYMBOLS (IN ORDER OF APPEARANCE); INTRODUCTION ; PART 1. BPSG THIN FILM DEPOSITION; Chapter 1 BRIEF HISTORICAL OVERVIEW OF BPSG THIN FILM RESEARCH ; Chapter 2 BASIC BPSG FILM CVD TOOLS AND METHODOLOGY ; 2.1. CVD PROCESS COMPOUNDS ; 2.2. BASIC CVD TOOL DESIGN FOR SILICON DIOXIDE AND GLASS FILM DEPOSITION ; 2.3. SOME BASIC THIN FILM CVD PROCESS PARAMETERS.
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|a Chapter 3 BASIC BPSG CVD KINETIC FEATURES 3.1. BASIC THIN FILM CVD KINETIC FEATURES ; 3.2. BASIC SILICON DIOXIDE THIN FILM CVD KINETIC FEATURES ; 3.3. BASIC SILICATE GLASS THIN FILM CVD KINETIC FEATURES ; 3.4. BASIC AEROSOL FORMATION FEATURES AT GLASS CVD ; Chapter 4 AS-DEPOSITED BPSG FILM STEP COVERAGE AND GAP-FILL ; 4.1. BASIC DEFINITIONS OF STEPPED DEVICE STRUCTURES ; 4.2. BASIC DEFINITIONS FOR THIN FILM CVD ON STEPPED DEVICE STRUCTURES ; 4.3. CHARACTERIZATION OF CVD PROCESSES ON STEPPED STRUCTURES ; 4.4. IMPROVEMENT OF GLASS FILM CVD ON STEPPED STRUCTURES.
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|a Chapter 5 GLASS FILM CVD SCHEMES 5.1. GENERAL THIN FILM CVD PROCESS SCHEME ; 5.2. CVD THIN FILM DEPOSITION PROCESSES CLASSIFICATION ; 5.3. THIN FILM SIO AND SILICATE GLASS DEPOSITION PROCESSES SCHEMES 2; Chapter 6 BPSG FILM INDUSTRIAL CVD TECHNOLOGY ; FINAL REMARKS ON PART 1 ; PART 2. BPSG FILM COMPOSITION, STRUCTURE, AND PROPERTIES ; Chapter 7 BRIEF REVIEW ON BPSG THIN FILM ANALYSIS TECHNIQUES ; 7.1. ANALYTICAL METHODS OVERVIEW ; 7.2. FTIR METHOD IMPLEMENTATION BPSG FILM COMPOSITION ANALYSIS ; 7.3. LASER SCANNING METHOD ; 7.4. MICROSCOPY METHODS.
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|a 7.5. TOTAL CHARGE MAPPING METHODS 7.6. SECONDARY ION MASS SPECTROMETRY METHOD ; Chapter 8 BPSG FILM COMPOSITION ; Chapter 9 BPSG FILM STRUCTURE ; 9.1. BRIEF REVIEW OF SILICA STRUCTURE: BASICS AND TERMS ; 9.2. BRIEF REVIEW OF BORON OXIDE AND PHOSPHORUS OXIDE STRUCTURES ; 9.3. BPSG COMPOSITION AND STRUCTURE ; 9.4. DIFFERENCES IN BPSG COMPOSITION AND STRUCTURE ; Chapter 10 BASIC BPSG FILM PROPERTIES ; 10.1. SURFACE MORPHOLOGY OF THIN GLASS FILMS ; 10.2. FILM MECHANICAL STRESS ; 10.3. FILM DENSITY -- FILM POROSITY -- FILM SHRINKAGE ; 10.4. FILM WET ETCH RATE.
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|a 10.5. GETTERING PROPERTIES OF BPSG FILMS10.6. ELECTRICAL PROPERTIES OF BPSG FILMS ; 10.7. SUMMARIES OF BPSG FILM PROPERTIES FOR PRODUCTION PROCESSES ; Chapter 11 BPSG FILM FLOW CAPABILITY ; 11.1. BRIEF DESCRIPTION OF GLASS FLOW BASICS ; 11.2. GLASS STRUCTURE FEATURES AND GLASS FLOW CAPABILITY ; 11.3. APPLICATION OF BULK GLASS PARAMETERS TO GLASS THIN FILM ; Chapter 12 BPSG FILM -- AMBIENT MOISTURE INTERACTION ; 12.1. TECHNIQUE FOR ANALYSIS OF MOISTURE EFFECTS IN THIN GLASS FILMS ; 12.2. FILM-MOISTURE INTERACTION ; 12.3. DESCRIPTION OF MOISTURE ABSORPTION EFFECTS IN BPSG FILMS.
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|a Text in English.
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590 |
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|a eBooks on EBSCOhost
|b EBSCO eBook Subscription Academic Collection - Worldwide
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650 |
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|a Electronic apparatus and appliances
|x Materials.
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|a Glass coatings.
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|a Boron compounds.
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|a Silicon compounds.
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|a Glass manufacture
|x Chemistry.
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|a Boron Compounds
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|a Silicon Compounds
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|a Verre
|x Revêtements protecteurs.
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|a Bore
|x Composés.
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|a Silicium
|x Composés.
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|a TECHNOLOGY & ENGINEERING
|x Electronics
|x Circuits
|x General.
|2 bisacsh
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|a Boron compounds
|2 fast
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7 |
|a Electronic apparatus and appliances
|x Materials
|2 fast
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650 |
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7 |
|a Glass coatings
|2 fast
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650 |
|
7 |
|a Glass manufacture
|x Chemistry
|2 fast
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650 |
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7 |
|a Silicon compounds
|2 fast
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700 |
1 |
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|a Vasilʹev, V. I͡U.
|q (Vladislav I͡Urʹevich)
|
776 |
0 |
8 |
|i Print version:
|t Borophosphosilicate glass thin films in electronics
|d New York : Nova Science Publishers, Inc., [2013]
|z 9781624179594 (hardcover)
|w (DLC) 2013002527
|
830 |
|
0 |
|a Materials science and technologies series.
|
856 |
4 |
0 |
|u https://ebsco.uam.elogim.com/login.aspx?direct=true&scope=site&db=nlebk&AN=619652
|z Texto completo
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