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Laser cleaning : optical physics, applied physics and materials science /
Laser cleaning is very important for modern high technology. It is used, or considered for use in the fabrication of printed circuit boards, in the production of dynamic random access memory (DRAM), in lithography and epitaxial growth, for the removal of contaminations during via-hole production, an...
| Clasificación: | Libro Electrónico |
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| Autor Corporativo: | |
| Otros Autores: | |
| Formato: | Electrónico Congresos, conferencias eBook |
| Idioma: | Inglés |
| Publicado: |
River Edge, N.J. :
World Scientific,
©2002.
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| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- pt. 1. History. ch. 1. The road to "steam laser cleaning" / W. Zapka
- pt. 2. Dry laser cleaning. ch. 2. Dry laser cleaning of particles by nanosecond pulses: theory / N. Arnold
- ch. 3. Optical resonance and near-field effects in dry laser cleaning / B.S. Luk'yanchuk [and others]
- pt. 3. Steam laser cleaning. ch. 4. Pulsed laser cleaning of particles from surfaces and optical materials / D.M. Kane, A.J. Fernandes, D.R. Halfpenny
- ch. 5. Liquid-assisted pulsed laser cleaning with near infrared and ultraviolet-pulsed lasers / C.P. Grigoropoulos, D. Kim
- ch. 6. Steam laser cleaning of silicon wafers: laser induced bubble nucleation and efficiency measurements / P. Leiderer [and others]
- ch. 7. Physical mechanisms of laser cleaning / V.P. Veiko, E.A. Shakhno
- pt. 4. Laser cleaning of artworks. ch. 8. Laser ablation in cleaning of artworks / V. Zafiropulos
- ch. 9. On the theory of discoloration effect in pigments at laser cleaning / B.S. Luk'yanchuk, V. Zafiropulos
- pt. 5. Applications of laser cleaning. ch. 10. Cleaning for field emitter arrays / M. Takai, N. Suzuki, O. Yavas
- ch. 11. Laser cleaning of organic contamination on microelectronic devices and process real-time monitoring / M.H. Hong [and others].