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Laser cleaning : optical physics, applied physics and materials science /

Laser cleaning is very important for modern high technology. It is used, or considered for use in the fabrication of printed circuit boards, in the production of dynamic random access memory (DRAM), in lithography and epitaxial growth, for the removal of contaminations during via-hole production, an...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor Corporativo: International Workshop on Laser Cleaning Singapore
Otros Autores: Lukʹi͡anchuk, B. S. (Boris Semenovich)
Formato: Electrónico Congresos, conferencias eBook
Idioma:Inglés
Publicado: River Edge, N.J. : World Scientific, ©2002.
Temas:
Acceso en línea:Texto completo

MARC

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111 2 |a International Workshop on Laser Cleaning  |n (1st :  |d 2001 :  |c Singapore) 
245 1 0 |a Laser cleaning :  |b optical physics, applied physics and materials science /  |c editor, Boris Lukyanchuk. 
260 |a River Edge, N.J. :  |b World Scientific,  |c ©2002. 
300 |a 1 online resource (xiv, 466 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
500 |a Review papers of the participants of the First International Workshop on Laser Cleaning held in Singapore in 2001. 
504 |a Includes bibliographical references and index. 
588 0 |a Print version record. 
505 0 |a pt. 1. History. ch. 1. The road to "steam laser cleaning" / W. Zapka -- pt. 2. Dry laser cleaning. ch. 2. Dry laser cleaning of particles by nanosecond pulses: theory / N. Arnold -- ch. 3. Optical resonance and near-field effects in dry laser cleaning / B.S. Luk'yanchuk [and others] -- pt. 3. Steam laser cleaning. ch. 4. Pulsed laser cleaning of particles from surfaces and optical materials / D.M. Kane, A.J. Fernandes, D.R. Halfpenny -- ch. 5. Liquid-assisted pulsed laser cleaning with near infrared and ultraviolet-pulsed lasers / C.P. Grigoropoulos, D. Kim -- ch. 6. Steam laser cleaning of silicon wafers: laser induced bubble nucleation and efficiency measurements / P. Leiderer [and others] -- ch. 7. Physical mechanisms of laser cleaning / V.P. Veiko, E.A. Shakhno -- pt. 4. Laser cleaning of artworks. ch. 8. Laser ablation in cleaning of artworks / V. Zafiropulos -- ch. 9. On the theory of discoloration effect in pigments at laser cleaning / B.S. Luk'yanchuk, V. Zafiropulos -- pt. 5. Applications of laser cleaning. ch. 10. Cleaning for field emitter arrays / M. Takai, N. Suzuki, O. Yavas -- ch. 11. Laser cleaning of organic contamination on microelectronic devices and process real-time monitoring / M.H. Hong [and others]. 
520 |a Laser cleaning is very important for modern high technology. It is used, or considered for use in the fabrication of printed circuit boards, in the production of dynamic random access memory (DRAM), in lithography and epitaxial growth, for the removal of contaminations during via-hole production, and for the cleaning of micro-optical and micro-mechanical components. This invaluable book presents the mechanics of the cleaning processes, experimental results, and different applications, including laser cleaning of art. It contains review articles by leading specialists in laser cleaning who participated in the 1st International Workshop on Laser Cleaning, held in Singapore in 2001. 
546 |a English. 
590 |a eBooks on EBSCOhost  |b EBSCO eBook Subscription Academic Collection - Worldwide 
650 0 |a Lasers  |x Industrial applications  |v Congresses. 
650 0 |a Materials science  |x Instruments  |v Congresses. 
650 6 |a Lasers  |x Applications industrielles  |v Congrès. 
650 6 |a Science des matériaux  |x Instruments  |v Congrès. 
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700 1 |a Lukʹi͡anchuk, B. S.  |q (Boris Semenovich) 
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