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Technology evolution for silicon nano-electronics : selected, peer reviewed papers from the proceedings of the International Symposium on Technology Evolution for Silicon Nano-Electronics 2010, June 3-5, 2010, Tokyo Institute of Technology, Tokyo, Japan /

Silicon ultra-large scale integrated circuits (ULSIs) are now faced with various physical limits to further scaling. Therefore, it is very important to establish the fundamental science and technology required to produce nano-scale complementary metal-oxide-semiconductor devices (Nano-CMOS) having h...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Autor Corporativo: International Symposium on Technology Evolution for Silicon Nano-Electronics Tokyo Institute of Technology
Otros Autores: Miyazaki, Seiichi, Tabata, Hitoshi
Formato: Electrónico Congresos, conferencias eBook
Idioma:Inglés
Publicado: Stafa-Zurich, Switzerland ; Enfield, N.H. : Trans Tech Publications, ©2011.
Colección:Key engineering materials ; v. 470.
Temas:
Acceso en línea:Texto completo

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