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Chemical vapor deposition /
| Clasificación: | Libro Electrónico |
|---|---|
| Otros Autores: | , |
| Formato: | Electrónico eBook |
| Idioma: | Inglés |
| Publicado: |
Materials Park, Ohio :
ASM International,
2001.
|
| Colección: | Surface engineering series ;
v. 2. |
| Temas: | |
| Acceso en línea: | Texto completo |
Tabla de Contenidos:
- Ch. 1. Introduction to Chemical Vapor Deposition (CVD) / J.R. Creighton and P. Ho
- Ch. 2. Basic Principles of CVD Thermodynamics and Kinetics / A.K. Pattanaik and V.K. Sarin
- Ch. 3. Stresses and Mechanical Stability of CVD Thin Films / M. Ignat
- Ch. 4. Combustion Chemical Vapor Deposition (CCVD) / A.T. Hunt and Matthias Pohl
- Ch. 5. Polarized Electrochemical Vapor Deposition / Eric Z. Tang, Thomas H. Etsell and Douglas G. Ivey
- Ch. 6. Chemical Vapor Infiltration: Optimization of Processing Conditions / S.K. Griffiths and Robert H. Nilson
- Ch. 7. Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba, Sr) TiO[subscript 3] Thin Films for Dynamic Random Access Memory Applications / C.S. Hwang and H.-I. Yoo.