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00000cam a2200000Ma 4500 |
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EBSCO_ocn646817910 |
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OCoLC |
| 005 |
20231017213018.0 |
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m o d |
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|a TS695
|b .C52 2001eb
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| 072 |
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|x 040000
|2 bisacsh
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| 082 |
0 |
4 |
|a 671.7/35
|2 21
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| 049 |
|
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|a UAMI
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| 245 |
0 |
0 |
|a Chemical vapor deposition /
|c edited by Jong-Hee Park, T.S. Sudarshan.
|
| 260 |
|
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|a Materials Park, Ohio :
|b ASM International,
|c 2001.
|
| 300 |
|
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|a 1 online resource (vii, 481 pages) :
|b illustrations
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| 336 |
|
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|a text
|b txt
|2 rdacontent
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| 337 |
|
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|a computer
|b c
|2 rdamedia
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| 338 |
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|a online resource
|b cr
|2 rdacarrier
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| 347 |
|
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|a data file
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| 490 |
1 |
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|a Surface engineering series ;
|v v. 2
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| 504 |
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|a Includes bibliographical references.
|
| 588 |
0 |
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|a Print version record.
|
| 505 |
0 |
0 |
|g Ch. 1.
|t Introduction to Chemical Vapor Deposition (CVD) /
|r J.R. Creighton and P. Ho --
|g Ch. 2.
|t Basic Principles of CVD Thermodynamics and Kinetics /
|r A.K. Pattanaik and V.K. Sarin --
|g Ch. 3.
|t Stresses and Mechanical Stability of CVD Thin Films /
|r M. Ignat --
|g Ch. 4.
|t Combustion Chemical Vapor Deposition (CCVD) /
|r A.T. Hunt and Matthias Pohl --
|g Ch. 5.
|t Polarized Electrochemical Vapor Deposition /
|r Eric Z. Tang, Thomas H. Etsell and Douglas G. Ivey --
|g Ch. 6.
|t Chemical Vapor Infiltration: Optimization of Processing Conditions /
|r S.K. Griffiths and Robert H. Nilson --
|g Ch. 7.
|t Metal-Organic Chemical Vapor Deposition of High Dielectric (Ba, Sr) TiO[subscript 3] Thin Films for Dynamic Random Access Memory Applications /
|r C.S. Hwang and H.-I. Yoo.
|
| 590 |
|
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|a eBooks on EBSCOhost
|b EBSCO eBook Subscription Academic Collection - Worldwide
|
| 650 |
|
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|a Vapor-plating.
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| 650 |
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0 |
|a Refractory coating.
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| 650 |
|
6 |
|a Revêtement réfractaire.
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| 650 |
|
7 |
|a TECHNOLOGY & ENGINEERING
|x Technical & Manufacturing Industries & Trades.
|2 bisacsh
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| 650 |
|
7 |
|a Refractory coating
|2 fast
|
| 650 |
|
7 |
|a Vapor-plating
|2 fast
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| 700 |
1 |
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|a Park, Jong-Hee,
|d 1951-
|
| 700 |
1 |
|
|a Sudarshan, T. S.,
|d 1955-
|
| 776 |
0 |
8 |
|i Print version:
|t Chemical vapor deposition.
|d Materials Park, Ohio : ASM International, 2001
|w (DLC) 2001022339
|
| 830 |
|
0 |
|a Surface engineering series ;
|v v. 2.
|
| 856 |
4 |
0 |
|u https://ebsco.uam.elogim.com/login.aspx?direct=true&scope=site&db=nlebk&AN=395831
|z Texto completo
|
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|b YANK
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