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III-nitride : semiconductor materials /

III-Nitride semiconductor materials - (Al, In, Ga)N - are excellent wide band gap semiconductors very suitable for modern electronic and optoelectronic applications. Remarkable breakthroughs have been achieved recently, and current knowledge and data published have to be modified and upgraded. This...

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Detalles Bibliográficos
Clasificación:Libro Electrónico
Otros Autores: Feng, Zhe Chuan
Formato: Electrónico eBook
Idioma:Inglés
Publicado: London : Singapore ; Hackensack, NJ : Imperial College Press ; Distributed by World Scientific, ©2006.
Temas:
Acceso en línea:Texto completo

MARC

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245 0 0 |a III-nitride :  |b semiconductor materials /  |c editor, Zhe Chuan Feng. 
260 |a London :  |b Imperial College Press ;  |a Singapore ;  |a Hackensack, NJ :  |b Distributed by World Scientific,  |c ©2006. 
300 |a 1 online resource (xii, 428 pages) :  |b illustrations 
336 |a text  |b txt  |2 rdacontent 
337 |a computer  |b c  |2 rdamedia 
338 |a online resource  |b cr  |2 rdacarrier 
347 |a data file 
504 |a Includes bibliographical references. 
505 0 |a Cover -- Contents -- Preface -- Chapter 1 Hydride vapor phase epitaxy of group III nitride materials -- 1. Introduction -- 2. Experiment -- 3. Material Properties -- 3.1. Undoped GaN layers -- 3.2. Si-doped GaN layers -- 3.3. Mg-doped GaN layers -- 3.4. Zn-doped GaN layers -- 3.5. AlN layers -- 3.6. AlGaN layers -- 3.7. InN and InGaN layers -- 4. New directions in HVPE development -- 4.1. Large area and multi wafer HVPE growth -- 4.2. Multi-layer structures -- 4.3. P-n junctions -- 4.4. Structures with two dimensional carrier gas -- 4.5. Nano structures and porous materials -- 5. Applications of HVPE grown group III nitride materials -- 5.1. Substrate applications -- 5.2. Device Applications -- 6. Conclusions -- Chapter 2 Planar MOVPE technology for epitaxy of III-nitride materials -- 1. History of Reactor Development for III-Nitrides. 
520 |a III-Nitride semiconductor materials - (Al, In, Ga)N - are excellent wide band gap semiconductors very suitable for modern electronic and optoelectronic applications. Remarkable breakthroughs have been achieved recently, and current knowledge and data published have to be modified and upgraded. This book presents the new developments and achievements in the field. Written by renowned experts, the review chapters in this book cover the most important topics and achievements in recent years, discuss progress made by different groups, and suggest future directions. Each chapter also describes the basis of theory or experiment. The III-Nitride-based industry is building up and new economic developments from these materials are promising. It is expected that III-Nitride-based LEDs may replace traditional light bulbs to realize a revolution in lighting. This book is a valuable source of information for engineers, scientists and students working towards such goals. 
588 0 |a Print version record. 
590 |a eBooks on EBSCOhost  |b EBSCO eBook Subscription Academic Collection - Worldwide 
650 0 |a Semiconductors  |x Materials. 
650 0 |a Nitrides. 
650 0 |a Semiconductors. 
650 0 |a Nitrides  |x Electric properties. 
650 0 |a Electronics  |x Materials. 
650 0 |a Metal organic chemical vapor deposition. 
650 2 |a Semiconductors 
650 6 |a Semi-conducteurs. 
650 6 |a Nitrures  |x Propriétés électriques. 
650 6 |a Électronique  |x Matériaux. 
650 6 |a Dépôt en phase vapeur par organométalliques. 
650 6 |a Semi-conducteurs  |x Matériaux. 
650 6 |a Nitrures. 
650 7 |a semiconductor.  |2 aat 
650 7 |a SCIENCE  |x Chemistry  |x Physical & Theoretical.  |2 bisacsh 
650 7 |a Semiconductors.  |2 fast  |0 (OCoLC)fst01112198 
650 7 |a Metal organic chemical vapor deposition.  |2 fast  |0 (OCoLC)fst01017612 
650 7 |a Electronics  |x Materials.  |2 fast  |0 (OCoLC)fst00907562 
650 7 |a Nitrides.  |2 fast  |0 (OCoLC)fst01037993 
650 7 |a Semiconductors  |x Materials.  |2 fast  |0 (OCoLC)fst01112237 
700 1 |a Feng, Zhe Chuan. 
776 1 |t III-nitride.  |d London : Imperial College Press ; Singapore ; Hackensack, NJ : Distributed by World Scientific, ©2006  |z 1860946364  |w (DLC) 2006299211  |w (OCoLC)70160598 
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